Low cost high throughput processing platform

ABSTRACT

As part of a system for processing workpieces, a workpiece support arrangement, separate from a process chamber arrangement supports at least two workpieces at least generally in a stacked relationship to form a workpiece column. A transfer arrangement transports at least two of the workpieces between the workpiece column and the process chamber arrangement by simultaneously moving the two workpieces at least generally along first and second transfer paths, respectively, that are defined between the workpiece column and the first and second process stations. The transfer arrangement can simultaneously move untreated and treated workpieces. Vertical motion swing arms and coaxial swing arms are described. A pair of spaced apart swing arms, the workpiece column and the processing stations can cooperatively define a pentagonal shape. Timing belt backlash elimination, a dual degree of freedom slot valve and low point chamber pumping, for removing chamber contaminants, are also described.

BACKGROUND OF THE INVENTION

Processing systems which expose workpieces such as, semiconductor wafersor other suitable substrates, to an overall treatment regimen forforming a particular device generally employ a plurality of treatmentsteps. In order to sequentially carry out these steps, each workpiece istypically moved a number of different times, for example, into thesystem, between various processing stations and out of the system. Withthe foregoing in mind, it is noted that the prior art contains a numberof alternative approaches for use in performing such workpiece transfersand related functions, certain ones of which are interest here, as willbe described in further detail immediately hereinafter.

One prior art workpiece transfer approach is demonstrated in U.S. Pat.No. 6,429,139 (hereinafter the '139 patent). More specifically, the '139patent, in FIGS. 5, 6 and 7A-D, illustrates the use of an articulatedrobot arm for use in workpiece transfer. While the use of a single waferpaddle is illustrated, it should be appreciated that multiple paddleshave been provided using such an articulated robot arm. It should alsobe appreciated that this particular robot is somewhat simplified to theextent that the prior art provides such a configuration in whichvertical movement of the workpiece is also accomplished by the robot.While such articulated robotic arm configurations effectively provideessentially unlimited capabilities with respect to moving workpieces,unfortunately, they are relatively complex and, therefore, expensive tomanufacture and maintain.

A simple swing arm, as taught by the prior art, generally comprises anarm member which extends from a pivot point to a wafer paddle. Such aswing arm, therefore, provides for rotational motion of a workpiece.While a swing arm configuration represents a dramatic simplificationover the use of an articulated robotic arm, at least generally thoughtto be accompanied by improved reliability and lower cost, it alsorepresents far more limited capabilities with respect to waferpositioning. Specifically, the swing arm, in its basic configuration, iscapable only of moving one wafer along a single diameter, planarcircular path. One early swing arm approach is seen in U.S. Pat. No.4,927,484 (hereinafter the '484 patent). FIGS. 1 and 2 of this patentdemonstrate a typical prior art approach in which a plurality of simpleswing arms cooperate in order to provide greater workpiece movementflexibility. Again, however, these swing arms appear to be limited torotation of a workpiece in a single plane.

As an alternative approach to the articulated robotic arm and animprovement over the simple swing arm, the '139 patent also teaches theuse of a double-ended swing arm arrangement. Swing arm capability isenhanced through providing an elongated swing arm member having a waferpaddle positioned at each of its opposing ends, with a pivot pointcentered therebetween, as can be seen in FIG. 8A of the '139 patent.Further, the '139 patent, as seen in FIGS. 9A-D, describes wafer paddlesthat are rotatable at the ends of the swing arm member so as to at leastsomewhat improve the positioning capabilities and flexibility of theswing arm over earlier prior art configurations. Unfortunately, however,swing arm positioning capabilities remain limited, despite theseimprovements, particularly with respect to the capability to move thewafer only in one plane of rotation.

A more recent approach with respect to the use of a swing arm is seen inU.S. Pat, No. 6,610,150 issued to Savage et al (hereinafter Savage).Savage illustrates, in FIG. 8 of the patent, a swing arm having an endeffector that is configured for supporting a pair of workpieces. Likethe remaining prior art, only simple rotational motion is describedwherein typical prior art expedients such as lift pins are used toremove a workpiece from the end effector.

Another area of concern with respect to prior art workpiece processingsystems resides in the door arrangements that are used to seal variousportions of the system from one another. Many systems utilize, forexample, a loadlock chamber (i.e., a chamber that facilitates bothworkpiece load and unload functions), a transfer chamber and one or moreprocess chambers. Workpieces are typically transferred between theloadlock chamber and the process chamber through the transfer chamber.It is necessary, in such a configuration, to selectively seal theloadlock chamber from the transfer chamber. For purposes of workpiecetransfer, a slot or slit is generally defined between the two chambers.Sealing is often performed using a slit door arrangement in which aplatelike door member is used to seal the elongated slit. Concerns withrespect to prior art slit door arrangements include contaminationproduction, the need for precision alignment and sealing mechanisms.

One prior art slit door configuration is described in U.S. Pat. No.6,095,741 (hereinafter the '241 patent) having a blade member which ishinged to its actuation arm for pivotal movement about a horizontalaxis. This arrangement is considered to be unacceptable, particularlywith respect to precision alignment of the elongated, horizontaldimension of the sealing blade and the potential production ofcontaminants in the absence of such precision alignment, as will beappreciated in view of the descriptions which follow.

With respect to sealing mechanisms, the '241 patent uses a bellows aspart of its slit door arrangement, illustrated as item number 704 inFIG. 6A of the patent. While such a bellows mechanism may be effectivefor purposes of the '241 patent, it is considered as problematic forreasons which include cost and reliability concerns. As will be furtherdescribed, the prior art has adopted other approaches as alternatives tothe bellows mechanism.

One such alternative to the bellows mechanism is illustrated in FIG. 29,which is a partially cutaway view of a prior art slit door configurationthat is generally indicated by the reference number 1700. This prior artconfiguration includes a pivot shaft 1702 that is connected at an upperend to a sealing blade (not shown) for pivotal motion, as indicated by adouble headed arrow 1704 about a pivot axis 1706. Pivot shaft 1702 isreceived in a housing 1710. Sealing between housing 1710 and pivot shaft1702 is accomplished using a seal flange 1712 that is received onhousing 1710 and sealed thereagainst using an O-ring 1714. A seal hat1716 is supported on pivot shaft 1702 and sealed thereagainst using anO-ring 1718. Seal hat 1716 supports an O-ring 1720 for sealing against asealing surface 1722 that is defined by seal flange 1712 such thatside-to-side motion of O-ring 1720 against sealing surface 1722 isaccommodated. Unfortunately, however, pivotal motion of pivot shaft 1702also imparts tilting of seal hat 1716 thereby compressing one portion ofthe O-ring 1720 while releasing an opposing portion of the O-ring. Thisbehavior is disadvantageously considered to limit the range of pivotalmotion of pivot shaft 1702.

The present invention resolves the foregoing limitations and concernswhile providing still further advantages.

SUMMARY OF THE INVENTION

A system for processing workpieces, as well as an associated apparatusand method are described. A plurality of workpieces are movable to andfrom a process chamber arrangement in the system. The process chamberarrangement uses at least two side-by-side, first and second processstations each of which is configured for executing a treatment processon one of the workpieces located at each of the first and second processstations such that two workpieces can simultaneously be exposed to thetreatment process. In one aspect of the present invention, a workpiecesupport arrangement, separate from the process chamber arrangement, isused for supporting at least two of the workpieces at least generally ina stacked relationship to form a workpiece column. A workpiece transferarrangement, also separate from the process chamber arrangement, is usedfor transporting at least two of the workpieces between the workpiececolumn and the process chamber arrangement by simultaneously moving thetwo workpieces at least generally along first and second transfer paths,respectively, that are defined between the workpiece column and thefirst and second process stations.

In another aspect of the present invention, workpieces are movable toand from a process chamber arrangement, the process chamber arrangementusing at least two side-by-side process stations, each of which isconfigured for treating individual ones of the workpieces located ateach of the process stations such that at least two workpieces cansimultaneously be treated. A workpiece support arrangement, separatefrom the process chamber arrangement, supports at least two of theworkpieces at least generally in a stacked relationship to form aworkpiece column. A workpiece transfer arrangement, separate from theprocess chamber arrangement, is configured at least for simultaneouslymoving two pre-treatment ones of the workpieces from the workpiececolumn to each of the side-by-side process stations.

In still another aspect of the present invention, workpieces are movableto and from a process chamber arrangement that is configured forexecuting a treatment process on at least one of the workpieces. Aworkpiece support arrangement, separate from the process chamberarrangement, supports at least one of the workpieces for movement inrelation to the process chamber arrangement. A swing arm arrangement,separate from the process chamber arrangement, includes at least a firstswing arm for providing pivotal rotation of at least one workpiece aboutan axis of rotation, as part of transporting the workpiece between theworkpiece support arrangement and the process chamber arrangement, andfor moving in a direction that is at least generally along the axis ofrotation, as another part of transporting the workpiece, to change anelevation of the swing arm such that the workpiece being transported canbe moved between different spaced-apart elevational planes in additionto the pivotal rotation.

In yet another aspect of the present invention, workpieces are movableto and from a process chamber arrangement that is configured forexecuting a treatment process on at least one of the workpieces. A swingarm arrangement includes at least a first swing arm for providingpivotal rotation of at least one workpiece about an axis of rotation, aspart of transporting the workpiece at least in relation to the processchamber arrangement, and for moving in a direction that is at leastgenerally along the axis of rotation, as another part of transportingthe workpiece, to change an elevation of the swing arm such that theworkpiece being transported can be moved between different spaced-apartelevational planes in addition to the pivotal rotation.

In a continuing aspect of the present invention, workpieces are movableto and from a process chamber arrangement in a system, the processchamber arrangement using at least one process station that isconfigured for executing a treatment process on at least one of theworkpieces. A workpiece support arrangement is arranged in one spacedapart relationship from the process chamber arrangement for supportingat least one of the workpieces. A swing arm arrangement is positioned inanother spaced apart relationship from the process chamber arrangementincluding at least a first swing arm and a second swing arm configuredfor coaxial rotation about a common axis of rotation for use intransporting the workpieces between the workpiece support arrangementand the process chamber arrangement.

In a further aspect of the present invention, workpieces are movable toand from a process chamber arrangement in a system. The process chamberarrangement uses at least one process station that is configured forexecuting a treatment process on at least one of the workpieces. A swingarm arrangement, forming part of the system, includes at least a firstswing arm and a second swing arm configured for coaxial rotation about acommon axis of rotation for use in transporting the workpieces inrelation to the process chamber arrangement.

In another aspect of the present invention for processing workpiecesusing a treatment process, a system configuration includes a pair ofside-by-side first and second process stations, each process stationconfigured for applying the treatment process to one of the workpieces.A workpiece support arrangement is configured for supporting one or moreof the workpieces. The workpiece support arrangement being positioned ata first distance at least approximately equally from each of the processstations. First and second swing arm arrangements are arranged to pivotabout a first axis and a second axis, respectively, such that each oneof the first axis and the second axis is positioned at leastapproximately at a second distance from the workpiece supportarrangement while the first axis is at least approximately spaced awayfrom the first process station by the second distance and the secondaxis is at least approximately spaced away from the second processstation by the second distance, such that the first process station, thesecond process station, the first axis, the second axis and the wafercolumn cooperate to define a pentagonal shape.

In still another aspect of the present invention, a workpiece processingsystem, for processing workpieces using a treatment process, includes aconfiguration having a pair of side-by-side first and second processstations defining a line extending through a first center of the firstprocess station and a second center of the second process station, eachprocess station is configured for applying the treatment process to atleast one of the workpieces. A workpiece support arrangement isconfigured for supporting at least one of the workpieces laterallyoffset from the line. First and second swing arm arrangements, each ofwhich pivots about a first axis and a second axis, respectively, arearranged at a first swing arm location and a second swing arm location,and each of the first swing arm location and the second swing armlocation is offset from the line on a common side thereof toward, butnot beyond the workpiece support arrangement such that the first processstation, the second process station, the first axis, the second axis andthe wafer column cooperate to define a pentagonal shape.

In a continuing aspect of the present invention, in using a first,driven shaft to rotationally drive a second shaft, a configurationincludes first and second toothed flexible closed-loop members. A firstpulley arrangement is mounted on the first shaft and a second pulleyarrangement is mounted on the second shaft for receiving the first andsecond toothed flexible members in a side-by-side relationship such thatat least a particular one of the pulley arrangements includes a firstpulley engaging the first toothed flexible member and a second pulleyengaging the second toothed flexible member, each of the first andsecond pulleys having a tooth receiving configuration which cooperateswith the first and second toothed flexible members to provide a givenbacklash clearance when engaged with the first and second toothed beltmembers, respectively. The first pulley and the second pulley aremounted with a rotational offset therebetween such that the toothreceiving configuration of the first pulley is rotationally offset withrespect to the tooth receiving configuration of the second pulley, basedon the given backlash clearance, in a way which limits an operationalbacklash of the particular pulley arrangement with respect to movementof the first and the second toothed flexible members to a value that isless than the given backlash clearance.

In still another aspect of the present invention, a valve apparatus andmethod are described for use in a workpiece processing system forprocessing workpieces. The system includes at least two adjacentchambers with a slot defined therebetween, through which slot theworkpieces are transportable and a chamber sealing surface, that is atleast generally planar, surrounding the slot and supporting a sealingarrangement surrounding the slot. The valve apparatus being configuredfor selectively opening and closing the slot using a sealing blademember including a blade surface that is configured for sealinglyengaging the sealing arrangement. An actuator arrangement moves thesealing blade member between an open position, away from the slot, toprovide for passage of the workpieces therethrough, and a closedposition in which the sealing blade member is brought into sealingcontact at least with the sealing arrangement and for supporting thesealing blade member in a way which provides for movement of the bladesurface, at least responsive to engagement with the sealing arrangement,that is characterized by two degrees of freedom for aligning the bladesurface with the sealing arrangement and, thereby, the sealing surface.

In a still further aspect of the present invention, a configuration isdescribed for use in a workpiece processing system for processingworkpieces. The system having at least two adjacent chambers that aresubject to contamination from internally and externally producedcontaminants. The configuration includes a chamber body arrangementwhich serves to define the adjacent chambers and a slot between theadjacent chambers, through which slot the workpieces are transportableand a chamber sealing surface, that is at least generally planar,surrounding the slot. The chamber body arrangement further defining achamber trough adjacent the slot and therebelow to form a portion of aparticular one of the adjacent chambers such that the chamber troughestablishes a lowermost region of the chamber body arrangement servingas a collection region for the contaminants, at least in being under aninfluence of the Earth's gravity, and the chamber body arrangementfurther defines a pumping port at least for use in evacuation of theparticular chamber. A valve arrangement is supported in the particularchamber for selective movement between a closed position, in which asealing blade thereof seals against the slot to isolate the adjacentchambers from one another, and an open position, in which the sealingblade retracts into the trough. A pumping arrangement is connected tothe pumping port at least for use in evacuation of the particularchamber by pumping from the trough in a way which serves to remove atleast a portion of the contaminants collected in the trough.

BRIEF DESCRIPTION OF THE DRAWINGS

The present invention may be understood by reference to the followingdetailed description taken in conjunction with the drawings brieflydescribed below.

FIG. 1 a is a diagrammatic view, in perspective, of a workpieceprocessing system that is produced in accordance with the presentinvention.

FIG. 1 b is a diagrammatic plan view of the system of FIG. 1 a, shownhere to illustrate further details of its structure.

FIG. 2 is a diagrammatic perspective view of a loadlock used in thesystem of FIG. 1 a, shown here to illustrate details of its structure.

FIG. 3 is another diagrammatic perspective view of the loadlock of FIG.2 further illustrating the appearance of a slot door arrangement, aswell as further details of the structure of the loadlock.

FIG. 4 is a diagrammatic view, in perspective, showing a transferchamber that is used in the system of FIG. 1 a connected to the loadlockalso used in the system and shown in further detail in FIGS. 2 and 3.

FIG. 5 a is a diagrammatic perspective, isolated view illustratingdetails of a dual swing arm arrangement that is used in the transferchamber of FIG. 4.

FIG. 5 b is a diagrammatic partially cut-away view, in cross-section,illustrating details of an end effector height adjustment arrangement,shown here to illustrate features that are not visible in the view ofFIG. 5 a.

FIG. 6 is a diagrammatic enlarged cut-away view, in cross-section, ofthe swing arm arrangement of FIG. 5 a, shown here to illustrate furtherdetails of its structure.

FIG. 7 is a diagrammatic enlarged cut-away view, in cross-section, ofthe swing arm arrangement of FIG. 6 that is further enlarged toillustrate details with respect to inner and outer swing arm shafts aswell as a housing therefor.

FIGS. 8 and 9 are diagrammatic plan views of cams that are used in theswing arm assembly of FIGS. 5 a-7, for use in establishing the height ofeach swing arm.

FIG. 10 a is a diagrammatic view, in perspective, of a bridge bracketthat supports a cam follower for engagement with the cams of FIGS. 8 and9.

FIG. 10 b is a diagrammatic partially cross-sectional view of the camfollower and a portion of the bridge bracket of FIG. 10 a, shown here toillustrate further details of the structure of these components.

FIG. 11 is a diagrammatic view, in perspective, illustrating furtherdetails with respect to one swing arm arrangement of the dual swing armarrangement of FIG. 5 a.

FIG. 12 is another diagrammatic enlarged cut-away view, incross-section, of the swing arm arrangement of FIG. 6 that is furtherenlarged to illustrate details with respect to the swing arm driveassembly.

FIG. 13 is a diagrammatic perspective view illustrating a counterrotation drive belt and pulley arrangement that is used to counterrotate one swing arm of a coaxial pair of swing arms.

FIG. 14 is a diagrammatic perspective view illustrating a drive belt andpulley arrangement that is used to rotate the other swing arm of thecoaxial pair of swing arms.

FIG. 15 is a simplified illustration, in perspective, of a drive beltand pulley arrangement that is used for purposes of minimizing drivebelt backlash.

FIG. 16 a and 16 b are diagrammatic plan views of the drive belt andpulley arrangement of FIG. 15, shown here to illustrate further detailswith respect to its arrangement.

FIG. 17 a is a diagrammatic view, in perspective, illustrating a slotvalve arrangement that is produced in accordance with the presentinvention.

FIG. 17 b is a diagrammatic view, in cross-sectional elevation, showingthe slot valve arrangement of FIG. 17 a to illustrate further details ofits structure.

FIG. 17 c is a diagrammatic partially cut-away view, in cross-sectionalelevation, showing an enlarged region of the view of FIG. 17 b,illustrating still further details of its structure.

FIG. 17 d is a diagrammatic view, in perspective, of the slot valvearrangement of FIG. 17 a illustrating further details with respect to ablade suspension mechanism.

FIG. 17 e is a diagrammatic view, in cross-section, illustrating detailswith respect to one feature of the blade suspension mechanism.

FIGS. 18 a-18 e form a series of diagrammatic plan views illustratingone process for implementing workpiece transfer and treatment in ahighly advantageous way.

FIGS. 19 a-19 l form a series of diagrammatic elevational views whichcooperate with the plan views of FIGS. 18 a-18 e to illustrate furtherdetails of the process.

FIG. 20 is a diagrammatic plan view illustrating a process chamber,transfer chamber and loadlock for purposes of describing one way inwhich variation of process station to process station spacing can beaccommodated.

FIG. 21 is a diagrammatic plan view of one embodiment of a system usinga swing arm arrangement of the present invention in conjunction withprocess stations that are housed in individual process chambers.

FIG. 22 is a diagrammatic plan view of another embodiment of a system,produced in accordance with the present invention, using a linearworkpiece drive and a portable workpiece column.

FIG. 23 is a diagrammatic plan view of an alternative embodiment of asystem produced in accordance with the present invention, using a linearworkpiece drive.

FIGS. 24 a-d are diagrammatic plan views of the linear drive andloadlock of the system of FIG. 23, shown here to illustrate workpiecemovement using a rotatable workpiece carrier.

FIGS. 25-27 are plan views of additional alternative embodiments ofsystems that are produced in accordance with the present invention.

FIG. 28 is a diagrammatic plan view of another embodiment of a systemusing a swing arm arrangement of the present invention in conjunctionwith process stations that are housed in individual process chambers.

FIG. 29 is a diagrammatic partially cutaway cross-sectional view, inelevation, of one embodiment of a prior art slit door arrangement, shownhere to illustrate details of its sealing configuration.

DETAILED DESCRIPTION

The following description is presented to enable one of ordinary skillin the art to make and use the invention and is provided in the contextof a patent application and its requirements. Various modifications tothe described embodiments will be readily apparent to those skilled inthe art and the generic principles herein may be applied to otherembodiments. Thus, the present invention is not intended to be limitedto the embodiment shown but is to be accorded the widest scopeconsistent with the principles and features described herein includingalternatives, modifications and equivalents, as defined within the scopeof the appended claims. It is noted that the drawings are not to scaleand are diagrammatic in nature in a way that is thought to bestillustrate features of interest. Further, like reference numbers areapplied to like components, whenever practical, throughout the presentdisclosure. Descriptive terminology such as, for example,uppermost/lowermost, right/left, front/rear and the like has beenadopted for purposes of enhancing the reader's understanding, withrespect to the various views provided in the figures, and is in no wayintended as been limiting.

Referring to FIGS. 1 a and 1 b, the former is a diagrammatic view, inelevation, of a processing system, generally indicated by the referencenumber 10, according to one embodiment of the present invention. FIG. 1b is a diagrammatic plan view of system 10. The processing system isgenerally made up of a front end 12, a loadlock section 14, a waferhandling section 15 and a processing section 16. This system can beemployed to perform a wide variety of processes on suitable workpiecessuch as, for example, various implementations of etching (plasmaetching, photochemical etching, chemical vapor etching, thermally drivenetching, ion etching, etc.), planarization (combination of etching anddeposition), cleaning and residue removal, and various implementationsof chemical, physical and ion deposition (PECVD, ALD, MOCVD, sputtering,evaporation, etc.). Suitable workpiece types include, but are notlimited to semiconductor, opto-electronic, memory media, and flat paneldisplays. Suitable workpiece materials include, but are not limited tosilicon, silicon germanium, glass and plastic. Suitable plasma basedprocess sources include, for example, inductively coupled plasma (ICP)sources, microwave sources, surface wave plasma sources, ECR plasmasources, and capacitively coupled (parallel plate) plasma sources. Anyappropriate process-defined pressure may be utilized.

Still referring to FIGS. 1 a and 1 b, front end 12 is generally atatmospheric pressure and defines a “mini-environment” that is configuredfor engaging a plurality of cassettes or FOUPs (Front Opening UnifiedPods shown in FIG. 1 a) 18 or other suitable workpiece transfer postionseach of which, in the present example, is configured for supporting 25semiconductor wafers. Opposite the engagement surfaces for the FOUPs,front end 12 is configured for engaging a pair of first and secondloadlocks 20 a and 20 b (only first loadlock 20 a is visible in the viewof FIG. 1 a), collectively or individually referred to as loadlock(s)20. FIG. 1 b illustrates, an intermediate station 21, which maycomprise, for example, a cooling station, that is positioned betweenloadlocks 20 a and 20 b. The first and second loadlocks are generallyidentical to one another and engage first and second transfer chambers,individually indicated by the reference numbers 22 a and 22 b, andcollectively or individually referred to as transfer chamber(s) 22. Thetransfer chambers, in turn, engage first and second process chambers 24a and 24 b, and may be referred to collectively or individually referredto as process chamber(s) 24. Each process chamber, as will be seenbelow, employs a side-by-side workpiece arrangement or side-by-sideprocess stations in which each process chamber can simultaneously exposea pair of workpieces to the same process. It is to be understood thatprocess chambers 24 a and 24 b may be used to practice the same processor to practice different processes.

With continuing reference to FIGS. 1 a and 1 b, in the present example,four plasma sources 26 a-d are used, corresponding to the four processstations, collectively provided by the process chambers for purposes ofconvenience. Reference numbers 26 a-d may be used to refer to associatedones of the process stations. It is noted that one suitable processchamber configuration, that is useful in the context of the presentinvention, is described in copending U.S. patent application Ser. No.10/828,614 (attorney docket no. MAT-17) which is commonly owned with thepresent application and incorporated herein by reference. Appropriatevalves are provided between the various chambers, as will be furtherdescribed, since processing is usually accomplished by way of a stagedvacuum sequence, starting from front end 12. In such a processingregimen, loadlocks 20 can be pumped down to a treatment or intermediatepressure from atmospheric pressure prior to transferring workpieces toand from process chambers 24 through transfer chambers 22. It should beappreciated that system 10 can readily be configured with only oneprocess chamber 24, one transfer chamber 22 and one loadlock 20, forexample, in the case where one process chamber can achieve a desiredlevel of throughput or where sequential processing is not required. Anoperator station 30, including a display 32 and input device 34, isprovided connected with a computer 40 for use in controlling the system.It is considered that one having ordinary skill in the art is capable ofappropriately programming computer 40 in order to achieve thefunctionality described herein, in view of this overall disclosure.

It is noted that piping and pumping facilities have not been illustratedin FIG. 1 a for purposes of illustrative clarity. A common facilitiesinput can be used for the distribution of pneumatics air, purge gas,process gas(es), and cooling water to one or two module configurations.Similarly, a single vacuum pump can be incorporated for single or dualmodule loadlock pumping accommodations. Separate gas panels can be usedto deliver process gasses to each module and each process module hasbeen configured with its own vacuum pump and pressure control devices,allowing for parallel processing capabilities. Pressure transducersaffixed to the loadlock(s), transfer chamber(s) and process chamber(s)are used to communicate pressures associated with processingfunctionality. Additionally, an assortment of vacuum and pressureswitches affixed to vacuum roughing lines are used for interlockpurposes. In view of this overall disclosure, it is considered that onehaving ordinary skill in the art is capable of implementing suchfacilities.

Attention is now directed to FIG. 2 which shows one of loadlocks 20 inisolation from the remainder of the system. It is noted that the topplate of the loadlock has not been shown to facilitate a view ofinterior details of its structure. Loadlock 20 includes an overall bodywhich defines a slit aperture 50 for communicating with one of transferchambers 22. An o-ring 52 is received in a face or chamber sealingsurface 54 of the loadlock for sealing against the associated transferchamber. A trough 56 is formed by the loadlock chamber body forreceiving a valve arrangement (not shown) having a blade member that isused to seal against the surface of the wall which opposes face 54, aswill be further described in detail below. For the moment, it isappropriate to note that the blade member advantageously retracts intotrough 56 when the valve arrangement is in an open position. On anopposing portion of the transfer chamber body, essentially opposite slitaperture 50, a front end slit 60 is defined through which workpieces aretransferred to and from front end 12 of FIG. 1 a. Any appropriate slitdoor arrangement may be used for purposes of sealing front end slitaperture 60 including, for example, the arrangement that is used on slitaperture 50, yet to be described. Other suitable door arrangementsincluding a magnetic door and a pneumatic door are described in U.S.Pat. No. 6,315,512, which is commonly owned with the presentapplication, and incorporated herein by reference.

Still referring to FIG. 2, a shelf arrangement 64 is provided forsupporting workpieces in loadlock 20 as these workpieces are transferredto and from both the front end and the process chamber of FIGS. 1 a and1 b. The shelf arrangement is made up of two sets of spaced apart blademembers alternating between a long blade 66 and a short blade 68 in anoverall stacked relationship. Accordingly, each set of blade membersincludes two long blades 66 and two short blades 68. It should be notedthat one long blade in combination with one short blade serves to makeup a shelf for an individual workpiece such that each shelf includes anasymmetric configuration. The long and short shelf blades may be formedusing any suitable material such as, for example, aluminum. Furtherdetails will be provided below with respect to the use of thisasymmetric configuration. Each shelf arrangement is supported using apair of fasteners 70 which may be of any suitable type such as, forexample, stainless steel. Spacers may be used to achieve the appropriatespaced apart relationship between the shelf blade member. The spacersmay be formed, for example, using the same material from which the shelfblades are formed. The shelf arrangement is configured for supportingfour workpieces in four vertically spaced apart support stations. Aswill be described in further detail below, the two uppermost workpiecesupport shelves are dedicated for use in supporting a pair of preprocessones of the workpieces while the two lowermost workpiece support shelvesare dedicated for use in supporting a pair of postprocess ones of theworkpieces. Thus, preprocess workpieces are always moved from front end12 of FIG. 1 a to the preprocess workpiece support shelves and then onto an associated one of process stations 26. Conversely, the lower pairof workpiece support stations is dedicated to the postprocess workpiecessuch that processed workpieces are always moved from an associated oneof process stations 26 to the postprocess pair of shelves. Workpiecesare stacked in the shelves so as to form a workpiece column, as will befurther described below. It is appropriate to note, for the moment, thatpairs of workpieces can be moved simultaneously to and from thisworkpiece column.

Referring now to FIG. 3 in conjunction with FIG. 2, the formerillustrates loadlock 20, in a perspective view, to illustrate furtherdetails of its construction, having shelf arrangement 64 removed. It isagain noted that the top plate of the loadlock has not been shown tofacilitate a view of interior details of its structure. Specifically,front end slit aperture 60 is shown surrounded by an O-ring seal 74.Further, a slit door valve arrangement 80 is shown installed for sealingslit aperture 50. The slit valve arrangement includes a sealing blade 82which is illustrated retracted into trough 56 of the loadlock body.Loadlock 20 is illustrated, like other chambers in the various figures,having its cover or lid removed for purposes of illustrative clarity.FIG. 1 a, however, shows these covers as they appear installed. Asuitable seal such as, for example, an O-ring seal 84 may be used toseal the lid against the chamber body. Slit valve arrangement 80 isactuated, in the present example, using a pneumatic linear actuator 86.Loadlock 20 defines a pair of pumping ports, only one of which isvisible, indicated by the reference number 87. It is of interest to notethat these pumping ports are arranged to pump from trough 56. Thisarrangement is considered to be advantageous since this trough comprisesa low point within the overall loadlock. Accordingly, the trough servesas a collection area for particles and other contamination that isintroduced into the loadlock during normal operation of the system. Bypumping from the trough, as a low point, it is intended to removeparticles and contamination as a normal consequence of operating thesystem. Loadlock 20 also includes a floor 88, above trough 50, whichdefines a pair of purge ports, only one of which is visible in thefloor, indicated by the reference number 89. Purge ports 89 can be usedin cooperation with pumping ports 87 to provide a crossflow duringpumping of the loadlock. That is, appropriate gases can be introducedthrough purge ports 89 while pumping takes place from pump ports 87. Inthis way, contaminants can advantageously be caused to flow toward andinto trough 56 for removal therefrom by pumping, as will be furtherdescribed. In FIG. 2, it is noted that the illustrated purge portreceives a diffuser 90, which can be formed, for example, from sinteredmetal, or porous ceramic or composite material (such as stainless steel,aluminum oxide, impregnated carbon fibers, among others).

Attention is now directed to FIG. 4, which illustrates loadlock 20connected to transfer chamber 22. It is also noted that various featuresthat are the subject of the present discussion can be seen in priorfigures such as, for example, FIGS. 1 a and 1 b. Further, the top plateof both the loadlock and the transfer chamber have not been shown tofacilitate a view of interior details of their features. The twochambers can be affixed to one another in any suitable manner such as,for example, using threaded fasteners that are inserted through mountingholes 92, shown in FIGS. 24. Transfer chamber 22 defines a processchamber slit door 100 configured for interfacing with one of processchambers 24, shown in FIGS. 1 a and 1 b. In the present example, slitdoor valve arrangement 80 is also used for purposes of opening andclosing process chamber slit door 100. Process chamber 22 is configuredfor supporting a swing arm arrangement 120 that is made up of fourindividual swing arms arranged in counterrotating pairs, as will bedescribed immediately hereinafter.

Turning now to FIG. 5 a in conjunction with FIG. 4, the former figureillustrates swing arm arrangement 120 in a perspective view and removedfrom transfer chamber 22 for purposes of illustrative clarity. It isnoted that FIG. 1 b diagrammatically illustrates swing arm arrangement120 with respect to counterrotation, however, its full symmetricmovement capabilities are seen in figures yet to be described. Anoverall baseplate 122 supports first and second swing arm pairs 124 aand 124 b, respectively. It is noted that identical reference numberswill be used to refer to the first and second swing arm pairs, havingcomponents associated with a particular pair identified by using “a” or“b” appended to the appropriate reference number. Thus, components thatare identical in each of the swing arm pairs may be referred toindividually or collectively without the appended “a” or “b”. Forexample, the swing arm pairs collectively include upper blades 128 a and128 b, which may be referred to collectively or individually, forpurposes of convenience, as upper blade(s) 128. The swing arm pairsfurther include lower swing arm blade(s) 130. Each of the upper swingarm blades extends to a distal end 140 that is configured for attachmentof an end effector 142 that is best seen as attached to swing arm blade130 b, in FIG. 5 a. A group of threaded fasteners 144 is used toadjustably attach end effector 142 to each swing arm blade. In this way,alignment adjustments are provided such that the end effectorsappropriately interlace with the shelves of shelf arrangement 64 ofFIGS. 2 and 4, as well as being properly interlaced with one another ina non-interfering manner, even when loaded with workpieces. It is notedthat the swing arms are shown in a convenient “home” position abovebaseplate 122, as will be further described. Further, a reference to aswing arm(s) can refer to the combination of one or more swing armblades with an associated end effector. Thus, swing arm 130 b refers toswing arm blade 130 a in combination with an attached one of endeffectors 142.

Referring to FIG. 5 b in conjunction with FIG. 5 a, the former is across-sectional view of the adjustable manner in which end effector 142is attached to distal end 140 of each swing arm blade such as, forexample, swing arm blade 130 b. In particular, fastener group 144includes a pair of locking flat head fasteners 146 a and 146 b, althoughany appropriate fastener can be used. A dowel pin 147 is press-fittedinto an aperture that is defined by swing arm blade 130 b, having a freeend that projects through another aperture that is defined by endeffector 142. A helical coil spring 148 surrounds dowel pin 147 andresiliently, locally biases the end effector away from the swing armblade. A hex screw 149, or other suited threaded device, is threadinglyreceived by swing arm blade 130 b for use in adjusting the end effectorheight in combination with fasteners 146 a and 146 b. It is noted thatthe surface of swing arm blade 130 b confronting end effector 142 andsurrounding fastener 146 b is arcuate in configuration to accommodatechanges in the angle of end effector 142 relative thereto with heightadjustment. End effector height adjustment may be accomplished, in oneexemplary way, by initially tightening fastener 146 b “snuggly” andfastener 146 a at least slightly withdrawn from a seated position.Fastener 146 a is then adjusted to set end effector 142 at a desiredangle. Hex screw 149 is then tightened to lock the desired end effectororientation.

Referring to FIG. 5 a, a bracket 150 extends downward from baseplate 122for supporting a lift motor 152 which rotates a lift motor pulley 154which, in turn, engages a lift belt 156. Lift belt 156 is receivedaround a lift pulley 158 that is supported on a shaft 160 which isitself rotatably supported by bracket 150. It is noted that lift belt156 may be tensioned in any suitable manner that is available in theprior art. As one example, one or more fasteners used to mount liftmotor 152 may be received in slotted holes such that the motor can bepivoted to tension lift belt 156. Having accomplished tensioning, thefasteners are then tightened. Any suitable motor may be used as liftmotor 152 such as, for example, a servo or stepper based motor. As willbe seen, no more than one full revolution of pulley 158 is needed. It isnoted that this motor includes an encoder for reading the position ofits output shaft and thereby identifying the position of lift pulley 158with a suitable degree of precision. Opposing ends of shaft 160 arereceived in couplers 162, each of which then engages a cam drive shaft164. Cams 166 a and 166 b will be described in further detail below. Forthe moment, it is appropriate to note that these cams facilitatecustomized vertical motion of each swing arm pair, responsive torotation of lift motor 152. The arrangement described herein isadvantageous with respect to providing synchronous vertical motion atspaced apart swing arm configuration locations, using a single drivemotor. In the alternative, however, separate drive motors can be used toproduce vertical motion of each swing arm pair. In this case, each motormay include an encoder, or a separate encoder may be provided for use inreading the vertical position of each swing arm pair.

Referring to FIG. 6 in conjunction with FIG. 5 a, attention is nowdirected to details of the swing arm mechanisms. To that end, FIG. 6 isa partial, further enlarged cross-sectional view, in elevation, of swingarm pair 124 b. It is to be understood, that swing arm pair 124 a isessentially identically configured, with certain exceptions to be noted.The first and second swing arm pairs are supported using brackets 170 aand 170 b that are suitably attached to base plate 122 so as to extenddownwardly therefrom. A linear stage 172 is used to engage a swing armhousing 176 so as to provide for up/down linear motion of the swing armhousing relative to brackets 170. One suitable linear stage 172 isavailable from NSK Japan, although any number of alternativeconfigurations can be provided which accomplish the desired linearmotion. Pneumatic cylinders 178 are provided, pivotally engaging andcaptured between base plate 122 and housing 176 of each swing armarrangement. Cylinders 178 are provided for counterbalance purposes andcan provide downward and upward biasing force for the swing armarrangements with respect to base plate 122. For example, the cylinderscan provide a force that counteracts that of atmospheric pressure, whenthe transfer chamber is under vacuum. As another example, when thetransfer chamber is running at atmospheric pressure, a force can beprovided to counter the weight of the robot under the force of gravity.In this regard, pressure regulation is provided to the cylinders in aknown way to produce and change the applied biasing force. Moreover, oneor more additional cylinders can be provided depending upon load demandsor a single cylinder can be used.

Referring to FIGS. 5 a-7, attention is now directed to further detailswith respect to the configuration of swing arm arrangement 120. FIG. 7is a further enlarged view, showing details within a dashed circle 180which appears in FIG. 6. Housing 176, being supported for verticalmotion, is sealed against the transfer chamber bottom using a sealarrangement 182. The latter includes an annular L-bracket 184 (FIG. 7)having one end that is captured between an annular sealing ring 186 anda bottom wall 188 of transfer chamber 20 (see also FIG. 4). Sealing ring186 can be retained in position, for example, using threaded fasteners189. An O-ring 190 is captured within an annular O-ring groove so as toseal L-bracket 184 against a peripheral step 191 (FIG. 6 and 7) that isdefined by transfer chamber bottom 188. An opposing end of L-bracket 184includes an annular seal arrangement that is made up of a quad seal 200that is held in position using a pair of grease retainers 202 and 204positioned above and below the quad seal, respectively. This quad seal,like all other such seals described herein, should be lubricated usingan appropriate lubricant such as, for example, a fluorinated grease thatis carried by grease retainers 202 and 204. Moving inward with respectto housing 176, an outer swing arm shaft 210 supports lowermost swingarm 130 of each swing arm pair. Outer swing arm shaft 210 is supportedfor rotation, at least in part, within a through passage 212, defined byhousing 176, using an upper bearing and seal assembly 214 (FIG. 7). Thelatter includes another quad seal 200 and grease retainers 202 and 204that are captured within an annular groove configuration which surroundsan uppermost opening leading into a through passage 216 which is definedby outer swing arm shaft 210. Below the seal arrangement, in the view ofFIG. 7, a bearing 220 is received for rotationally supporting the upperend of outer swing arm shaft 210. A similar bearing 220 (FIG. 6)supports a lowermost end of outer swing arm shaft 210. An inner swingarm shaft 226 is received for rotation within through passage 216 ofouter swing arm shaft 210.

FIG. 7 illustrates the way in which an upper end of inner swing armshaft 226 is supported for rotation using a bearing/seal arrangement 228that is essentially identical, from a functional standpoint, to the sealarrangement that is used between housing 176 and the uppermost end ofouter swing arm shaft 210. It is noted that any suitable type of bearingcan be used for rotationally supporting both the inner and outer swingarm shafts. Suitable bearing types include, but are not limited toangular contact and radial contact ball bearings. Bearing arrangement228 is retained between the inner and outer swing arm shafts byattachment of lower swing arm 130 to outer swing arm shaft 210 using aplurality of threaded fasteners 230 (only one of which is shown) thatare distributed around an axis of symmetry 232 of the swing armarrangement. Hence, the lower swing arm serves as a seal and bearingretainer. Bearing 220 (FIG. 6) can also be used between the lowermostends of the inner and outer swing arm shafts and, hence, will not bedescribed for purposes of brevity. It is noted that upper swing arm 128is affixed to inner swing arm shaft 226 using a clamping arrangement(FIG. 5 a) having a clamp shell 234 which engages a clamping end ofupper swing arm 128 via threaded fasteners received in clamp apertures238 such that the rotational position of the upper swing arm can beadjusted in relation to the lower swing arm. Any number of alternativesmay be employed for purposes of insuring that the swing arms interlaceproperly. As one example (not shown), outer swing arm shaft 210 andinner swing arm shaft 226 of swing arm assembly 124 a can beappropriately longer than the corresponding components that are used inswing arm assembly 124 b. As another example, an extension spacer 239arrangement can be added, as will be described in further detail below.

With reference to FIGS. 5 a-10 a, attention is now directed to theconfiguration of the dual swing arm assembly with respect to the way inwhich vertical motion is achieved using cams 166. Each of these camsincludes a cam mounting plate 240 (FIG. 6) that is fixedly attached to acam plate 242 such that the cams rotate with cam drive shafts 164 a and164 b. FIGS. 8 and 9 illustrate the appearance of cam faces 243 a and243 b of cam plates 242 a and 242 b, respectively, as will be furtherdescribed below.

Referring to FIGS. 8-9, 10 a and 10 b, each cam plate defines a camgroove 246 which receives a cam follower 248. FIGS. 8 and 9 illustratethat cam grooves 246 a and 246 b are mirror images of one another.Rotation of each cam moves the associated swing arms between elevations1-4, as identified around each cam groove through engagement by camfollower 248. In FIGS. 8 and 9, the cams and, thereby, the swing armpairs are at elevation 1, since each cam follower is received at a lowpoint in each cam groove (as shown in phantom in FIGS. 8 and 9),although many alternative configurations can be provided. The swing armheight that is associated with each of the cam elevations will bedescribed in conjunction with subsequent ones of the figures. It shouldbe appreciated that cam plates 242 a and 242 b are interchangeable solong as such interchange is accompanied by a reversal in rotationdirection. In the present example, cam plate 242 a rotates in anindicated counterclockwise direction (CCW), while cam plate 242 brotates in an indicated clockwise (CW) direction. Apertures 247 areprovided for use in attaching the cam plates to the cam mounting plates.FIG. 10 b is a partially cutaway view, in partial cross-section, of camfollower 248, as it is received in a bridge bracket 256. For example,cam follower 248 includes a threaded mounting shaft 257 a that isreceived in an aperture that is defined by bridge bracket 256. A nut 257a threadingly engages shaft 257 a. An opposite end of shaft 257 asupports a cam roller 257 c for rotation. The cam roller is sized to bereceived in one of cam grooves 246. Such rotational support can beprovided in many well-known ways such as, for example, by using abearing (not shown). Bridge bracket 256 is connected to housing 176(FIG. 5 a) using threaded fasteners received in apertures 258 andincludes a U-shaped configuration for purposes of bridging bracket 170so that cam follower 248 provides vertical motion of housing 176, aslimited by linear stage 172, and the swing arm shafts supported therein.

Referring primarily to FIGS. 6, 11 and 12, a rotational drivearrangement, generally indicated by the reference number 300 in FIG. 11,for use in counterrotating the upper and lower swing arm of each swingarm pair, will now be described in detail. FIG. 11 provides a generalperspective view of this arrangement for swing arm pair 124 a with theswing arm blades removed, while FIG. 12 provides an enlarged view withina dashed line 301, shown in FIG. 6. Drive arrangement 300 includes adrive base plate 302 that is mounted to a lowermost end of housing 176.A U-bracket 304 includes a lowermost surface to which a gear drive 306is mounted and which is, in turn, driven by a motor 310 (FIGS. 5 a, 6and 11). Motor 310 may comprise any suitable type of motor such as, forexample, servo or stepper motor. Gear drive 306 drives a toothed pulley308 (FIG. 6). This latter pulley will be described in further detailbelow, however, for the moment, is appropriate to note that the pulleymust be sufficiently long so as to be capable of simultaneously drivinga plurality of four spaced apart timing belts along its overall length.Spacer arrangement 239 is shown in FIG. 11, made up of an upper swingarm spacer 311 a and a lower swing arm spacer 311 b in order toappropriately elevate swing arm arrangement 124 a with respect to swingarm arrangement 124 b to provide for the swing arm interlacing shown inFIG. 5 a.

Referring primarily to FIG. 12, a first pulley arrangement 312 is madeup of first and second side-by-side pulleys 314 and 316 that arereceived by the lowermost end of outer swing arm shaft 210. This latterpulley arrangement may be referred to as a split pulley arrangement. Asecond pulley arrangement 320 is similarly made up of first and secondpulleys 322 and 324 that are received by a lowermost end of inner swingarm shaft 226. With brief reference to FIG. 11, it is noted that anarrangement of elongated apertures is defined by pulley 324 for pulleyoffset purposes. A clamp 325 holds a flag plate 326 in position on areduced diameter distal end of the lowermost end of the inner swing armshaft. The flag plate is configured to block light emitted by an opticalsensor 330 (FIG. 11) that is mounted to base plate 302 over an angulardisplacement that is equal to the total angular movement of upper swingarm 128 a between the workpiece column and its corresponding processstation. A third, idler pulley arrangement 350 includes a pulley 352,configured for receiving belts 366 and 368, which is itself rotationallysupported by an idler pulley mount 356 that adjustably engages baseplate 302 such that pulley 352 rotates on an idler pulley shaft 358. Inthis regard, both gear drive 306 and pulley mount 356 are mounted in away which provides for a degree of pivotal rotation, generally in themanner described above with respect to lift motor 152 of FIG. 5 a, forexample, using fasteners which pass through slotted holes in a mannerthat is known in the useful arts. Such pivotal rotation is useful forpurposes of adjusting belt tension, as will be described immediatelyhereinafter.

Still referring primarily to FIG. 12, four belts are rotated by drivenpulley 308. A first pair of lower swing arm timing belts includes alower arm leading belt 360 and a lower arm lagging belt 362 that engagepulleys 314 and 316, respectively. A second pair of upper swing armtiming belts includes an upper arm leading belt 366 and an upper armlagging belt 368. The reason for the use of “lagging” and “leading”nomenclature applied in naming these belts will be made apparent below.Suitable belts for use in this application, including lift belt 156 ofFIG. 5 a, should be formed from materials resistant stretching such as,for example, polyurethane and/or Kevlar reinforced neoprene. A pair ofbolts 369 (FIG. 12) is illustrated for holding pulleys 322 and 324 in afixed rotational offset.

Turning now to FIGS. 13 and 14 in conjunction with FIG. 12, attention isnow directed to the arrangement of the belt drive shown in FIG. 12, asit appears in diagrammatic perspective views, taken from below, forpurposes of generally illustrating the paths taken by the belts. To thatend, FIG. 13 illustrates pulley arrangements 320 and 350 in relation todriven pulley 308, as engaged by belts 366 and 368. It is noted thatteeth have been illustrated on only a portion of the pulleys forpurposes of simplicity, although it is to be understood that each pulleyincludes an essentially identical toothed configuration that is matchedby all of the belts in use. Each of pulley arrangements 320 and 312includes a pattern of elongated slots for receiving threaded fasteners(see bolts 369 of FIG. 12) in order to fixedly offset the tooth patternof each pair of pulleys, for reasons which will be made apparent.

It should be appreciated that belts 366 and 368 are configured havingteeth on both opposing major surfaces of the belts. Therefore, the“front side” of each belt engages pulley arrangements 320 and 350 whilethe “back side” of each belt engages driven pulley 308. Accordingly, inthe instance where driven pulley 308 rotates clockwise as indicated byan arrow 380, pulley arrangements 320 and 350 will rotatecounterclockwise, as indicated by an arrow 382.

FIG. 14 illustrates pulley arrangement 312 in relation to driven pulley308, as engaged by belts 360 and 362. In this case, clockwise rotationof driven pulley 308 produces clockwise rotation of pulley arrangement312. Therefore, pulley arrangements 312 and 320 coaxially counterrotatewith respect to one another, since all of the pulley arrangements aredriven by a common driven pulley 308. Therefore, because pulleyarrangement 312 is supported by outer swing arm shaft 210, while pulleyarrangement 320 is supported by inner swing arm shaft 226, the inner andouter swing arm shafts, likewise, counterrotate with respect to oneanother responsive to any rotation of driven pulley 308.

Referring briefly to FIGS. 5 a and 6, the reader will recall that outerswing arm shaft 210 supports one of lower swing arms 130, while innerswing arm shaft 226 supports one of upper swing arms 128. The upper andlower swing arms of each swing arm pair 124, therefore, counterrotatewith respect to one another by an equiangular amount for any givenrotation of pulley 308. In this regard, it is noted that flag plate 326(FIG. 11) co-rotates with inner swing arm shaft 226. As a result of thecounter rotation configuration that is used, after initial alignment,identification of the position of the inner swing arm shaft also causesthe position of the outer swing arm shaft to be known. As should beevident in the context of this application for driving swing arms, nomore than one full revolution of each swing arm is required and,generally, significantly less than one revolution is often therequirement. In the present example, each swing arm rotatesapproximately ±60 degrees from a center or home position, therebyexhibiting a total rotation of approximately twice that value. The swingarm arrangement of the present invention advantageously provides foradjustment of the overall angular displacement in view of a particularinstallation, as will be further described in detail at appropriatepoint hereinafter.

Referring now to FIG. 15, a simplified example will now be provided forpurposes of explaining the backlash compensation concept of the presentinvention using a diagrammatic perspective view of a pulley arrangementthat is generally indicated by the reference number 400. The latter ismade up of pulley A, pulley B and pulley C. Pulley A is driven by asuitable arrangement such as, for example, a motor (not shown) andfunctions in a manner that is similar to that described above withrespect to pulley 308 of FIG. 12, wherein the pulley is sufficientlyelongated so as to support a plurality of spaced apart toothed belts.All of these pulleys include an identical tooth receiving pattern.

Referring to FIGS. 16 a and 16 b, in conjunction with FIG. 15, pulleys Band C are mounted on a common shaft, which has not been shown forpurposes of illustrative clarity, such that the tooth receiving patternof pulley B is offset with respect to that of pulley C which may beaccomplished for example using a elongated slot aperture configuration,as described above. This offset may be on the order of the backlashvalue that is present between one of the pulleys and its engaging belt.It is noted that the backlash value has been exaggerated in the figuresfor illustrative purposes. Such a value may be specified, for example,by a manufacturer. In the present example, a backlash value ofapproximately 0.02 inch is seen. Therefore, the offset between thepulleys may be set to this value or slightly less. Depending on aparticular direction of rotation, one of the belts or pulleys may bedescribed as leading or lagging the other belt, as mentioned above. Ofcourse, the relative leading/lagging phase of the respective belts maybe reversed by simply rotationally offsetting the pulleys in an oppositedirection with respect to one another.

Still referring to FIGS. 15, 16 a and 16 b, in the present example, abelt 402 engages pulleys A and B, while a belt 404 engages pulleys A andC. Pulley A is being rotated in a counterclockwise direction as isindicated by an arrow 406. For purposes of simplicity, only a limitednumber of teeth 410 have been illustrated on belts 402 and 404. It isnoted that the present figures illustrate the pulley arrangement at agiven point in time such that pulley A is in the same rotationalposition in all of the figures. Pulleys B and C are understood to becoaxially mounted in a way which provides for adjustment of an angularoffset therebetween. It is considered that one of ordinary skill in theart is capable of implementing such an offset arrangement in view ofthis overall disclosure. The angular offset is indicated by an offsetangle a that is shown in FIG. 16 a. In this example, pulley C leadspulley B by angle α. The backlash value is illustrated by an angle β inFIG. 16 a. In the present example, the offset angle has been shown asapproximately double the backlash value to compensate for backlash thatis introduced by belts 402 and 404.

Still considering pulley arrangement 400, teeth 410 a and 410 b of belt402 are engaged by pulley A (FIG. 16 a) thereby causing belt 402 to movein a direction indicated by an arrow 414. Responsive to movement of belt402, teeth 410 c and 410 d engage pulley B to cause it to rotate incounterclockwise direction 406. Pulley C (FIG. 16 b) co-rotates withpulley B such that it engages belt teeth 410 e and 410 f. This action,in turn, causes teeth 410 g and 410 h of belt 404 to engage pulley A sothat a leading edge of each belt tooth rotates pulley A. In this way,backlash angle β trails belt teeth 410 g and 410 h, as illustrated inFIG. 16 b with respect to belt tooth 410 g. Subsequently, when pulley Areverses to clockwise rotation, belt teeth 410 g and 410 h willimmediately be engaged by pulley teeth 414 a and 414 b, respectively, ofpulley A. Responsive thereto, belt teeth 410 e and 410 f willimmediately engage pulley teeth 414 c and 414 d of pulley C in aclockwise direction such that backlash is eliminated, at least from apractical standpoint. At the same time, tension transfers from belt 402to belt 404. It is to be understood that this highly advantageousconfiguration, while being described in the context of driving counterrotating swing arms, is not limited to the applications described hereinbut may enjoy a wide range of applicability in virtually any situationwhere it is desired to eliminate backlash arising from the use oftoothed pulleys and flexible drive members.

Referring generally to FIGS. 17 a through 17 d, attention is nowdirected to details with regard to slit door valve arrangement 80, whichwas previously shown in FIGS. 3 and 4. FIG. 17 provides a prospectiveview of slit door arrangement 80, while FIG. 17 b is a diagrammaticcross-sectional view taken along a line 17 b-17 b shown in FIG. 17 a.FIG. 17 c is a further enlarged view of a portion of the slit door valvearrangement within an area 500, indicated by a dashed line in FIG. 17 b.FIG. 17 d is a perspective view, looking angularly downward on an upperportion of arrangement 80.

Referring to FIGS. 17 a and 17 b, slit door valve arrangement 80includes a linear actuator 502 such as, for example, a pneumatic linearactuator. This actuator includes a drive shaft 504 that is capable ofvertical movement in the view of these figures. Shaft 504 is connectedto a linkage arrangement 506 that is comprised of a first link 508 and asecond link 510. One end of first link 508 is pivotally attached to aslide bracket 512 while its opposing end is pivotally attached to shaft504. Link 510 includes one end that is pivotally attached to a bladelever 514 and an opposing end that is pivotally attached to shaft 504.Blade lever 514 is supported at an axle 516 within a pivot shaft 518such that lever 514 can be rotated about axle 516 within pivot shaft 518responsive to movement of the lowermost end of the lever produced bylinkage arrangement 506, as will be described. Pivot shaft 518 issupported by linear slide 512 which, in turn, slidingly engages a fixedbracket 520. Bracket 520 also supports actuator 502 in a suitable mannersuch as through the use of an appropriate fastener 522, so that theactuator is positionally fixed for applying movement forces to bladelever 514 via linkage 506. Accordingly, lever 514 can be moved upwardand downward responsive to actuator 502. Movement forces are thentransferred to pivot axle 516 through the length of the blade leverwhich, in turn, causes pivot shaft 518 to move in concert with the bladelever. An uppermost end of pivot shaft 518 sealingly receives a ballflange 530. Sealing can be accomplished, for example, using an O-ringreceived within an annular groove 532. Ball flange 530 can be fixedlyattached to pivot shaft 518 in any suitable manner such as, for example,by threaded engagement. A sealing and guiding arrangement 540 includesan annular bushing 542 which serves to constrain nonvertical movementsof pivot shaft 518. A sealing arrangement 546 is positioned immediatelyabove bushing 542 for sealing against pivot shaft 518. Any suitablesealing arrangement may be utilized including, for example, the quadseal arrangement described above with regard to FIG. 7. Duringoperation, upward movement initially causes the blade lever to moveupward, without rotation, until a peripheral cover hard stop 548 a (FIG.17 b), encounters a pivot shaft stop step 548 b, and limits any furthervertical rise. At this point, links 506 and 508 pivot in a way whichrotates the lower end of blade lever 514 clockwise in the view of FIG.17 b. A sealing blade 549 responsively advances to contact a confrontingchamber sealing surface (see FIG. 3). The sealing blade and othercomponents may be formed from any suitable material such as, forexample, the particular material that the engaged chamber body is formedand aluminum. Downward motion of pivot shaft 518, of course, results inan opposite behavior of the mechanism.

Referring again to FIGS. 17 a-17 d, sealing and guiding arrangement 540(FIG. 17 b) is received in an uppermost opening that is defined by anupper end 550 (FIG. 17 a) of bracket 520. In this regard, it is notedthat bracket 520 includes a general inverted L shape. Upper end 550 ofbracket 520 is attached to an adapter plate 552 in any suitable mannersuch as, for example, using threaded fasteners (not shown). It should beappreciated that an uppermost end 560 of lever 514 can move laterally,in the view of the figure, with pivotal motion of the lever in relationto ball flange 530. Therefore, an appropriate sealing arrangement mustbe provided between uppermost lever end 560 and ball flange 530. To thisend, a socket cap 562 is received around upper lever end 560 against anannular step 564 defined thereby. Socket cap 562 is sealed againstuppermost lever end 560, for example, using an O-ring that is receivedin an annular groove 566. An outermost annular periphery of socket cap562 is sealed against ball flange 530 using an O-ring 570 (FIG. 17 c)that is received within an annular groove 572. A jam nut 574, or othersuitable mechanical expedient, is used to retain socket cap 562 againstball flange 530 while capturing an alignment yoke 576 therebetween. Jamnut 574 can be threadingly received on an enlarged diameter, threadedportion 578 of uppermost end 560 of lever 514. In the currentembodiment, jam nut 574 is tightened until it reaches hardstop. Thisensures that the position of socket cap 562 is held in tolerancedproximity to ball flange 530. Ideally, the spherical surfaces exhibitedby both the socket cap and ball flange share a common center point. Theball and socket sealing configuration provided by this configuration isconsidered to be advantageous with respect to accommodation ofsignificant lateral movement, while maintaining a seal between ballflange 530 and socket cap 560.

As compared to the prior art, embodied, for example, by slit door 1500of FIG. 29, slit door arrangement 80 accommodates more pivotal movementwhich allows for increased movement away from sealing surface which, inturn, reduces the possibility of rubbing contact during the verticalmotion phase. Still further advantages are provided with dual degree ofmotion capability so as to avoid a need for precise installationadjustments.

Referring primarily to FIGS. 17 a, 17 c and 17 d, uppermost lever end560 includes a distal end 580 (FIG. 17 c) which supports a bladesuspension member 582, in turn, for supporting sealing blade 549. Bladesuspension member 582 is itself pivotally supported on distal end 580using first and second bearings 588 a and 588 b, respectively. Thesebearings are configured for providing rotational movement of thesuspension stage. First bearing 588 a, in the present example, is a ballbearing, while second bearing 588 b is a needle bearing. It iscontemplated that any number of alternative bearing arrangements may beused for supporting blade suspension member 582, so long as appropriatepivotal motion is achieved in conjunction with the capability totransfer sufficient radial force. The suspension member and bearing 588are held to distal end 580, for example, by using a shoulder screw 590which threadingly engages the distal end and retains bearings 588 a and588 b. Suspension member 582 includes a pair of laterally extendingsuspension arms 592 (FIGS. 17 a and 17 d). Distal ends of arms 592 arepivotally received in pivot blocks 594 that are fixedly attached to abackside surface of sealing blade 549, for example, using threadedfasteners (not shown) that are received in a pair of openings 596 andextend into sealing blade 549 in a familiar manner. A pitch biasingspring 598 is attached at one end using fasteners 600 to blade 549. Thepitch biasing spring, as best seen in FIG. 17 d, then wraps aroundsuspension member 582 for attachment to a surface thereof which isopposite sealing blade 549, using another pair of fasteners 600. Acut-out area 602 (FIG. 17 d) of the biasing spring provides an accessmargin for shoulder screw 590. While spring 598 is shown attached to arearward facing surface of blade member 549 in FIGS. 17 a-c and 17 e, itcan be designed for attachment to an upper surface of the blade member,as is shown in FIG. 17 d, depending on the sealing blade geometry andclearance requirements in a particular application. It is noted thatpitch biasing spring 598 maintains a desired rotational position ofblade 549 with respect to rotation about an axis 599 (indicated by adashed line in FIG. 17 a) of blade suspension member 582 when valvearrangement 80 is in its open position. That is, this desired rotationalposition is invoked when blade member 549 is not contacting or drawsaway from a chamber wall sealing surface surrounding a slit opening (seeFIG. 3). On the other hand, when blade member 549 contacts such achamber wall sealing surface, pitch biasing spring 598 allows pivotalrotation about axis 599 of suspension member 582 such that the blademember rotates to accommodate a vertical tolerance between the blademember and the chamber wall, in order to provide an acceptable sealwithout a need for precision tolerance adjustments.

Referring to FIGS. 17 a and 17 d, yoke 576 includes opposing arms 608(FIG. 17 d) having vertically extending distal ends 610, each of whichdefines a through opening for receiving a threaded fastener 612 whichthreadingly engages arms 592 of suspension member 582.

As seen in FIG. 17 e, which is a cross-sectional view that is takenalong a line 17 e-17 e in FIG. 17 d, biasing springs 614 are captured byfasteners 612 between each distal end 610 of yoke 576 and each one ofthe suspension arms to resiliently bias each distal end 610 away fromits associated suspension arm 592. Springs 614 thereby serve in anadvantageous manner so as to center blade member 549 with respect torotation about an axis 616 (indicated using a dashed line in FIG. 17 a)of lever 514 when the blade member is not contacting a chamber sealingsurface. When the chamber sealing surface is contacted by the blademember, however, springs 614 accommodate limited rotation of the blademember about lever 514 in order to compensate for a lateral orhorizontal tolerance between blade member 549 and a chamber sealingsurface by rotating about axis 616. Thus, the configuration of valvearrangement 80 advantageously provides for two degrees of freedom forblade member 549, as it engages a chamber sealing surface so as to avoida need for high precision alignment, since a significant range oftolerance range can be compensated with respect to the vertical andhorizontal axes of rotation. For example, assembly variations ofapproximately 0.100 inch are permissible. Moreover, it should beappreciated that the “ball and socket” configuration provided by ballflange 530 and socket cap 562 accommodates substantial lateral movementof blade member 549 toward and away from the chamber sealing surface. Inthis way, substantial lateral movement, prior to vertical movement ofthe sealing blade, allows increased rotational tolerances and/orrelatively larger sealing blades, provided by significantly greaterclearance between the chamber wall and sealing blade during verticalmovement so as to avoid rubbing contact which can generate particles.

Having described the various components of system 10 in detail above,attention is now directed to the operation of the system, withparticular regard to the use of the swing arm arrangement of the presentinvention. A first series of FIGS. 18 a-e diagrammatically illustratesystem 10 in a plan view, sequentially showing transfer of workpieceswith ongoing processing. This first series of figures is supplemented bya second series of FIGS. 19 a-l which diagrammatically illustratesequential movements of the workpieces in an elevational view withongoing processing. For purposes of simplicity, the present descriptionmay refer to workpieces as wafers. Most of the subject figures arelimited to illustrating the combination of one loadlock 20, interfacedwith one transfer chamber 22 which is, in turn, interfaced with oneprocess chamber 24 having dual process stations 26 a and 26 b.Components of front end 12 will be illustrated as necessary. A workpieceor wafer column 700 is positioned in loadlock 20, as defined by shelfarrangement 64 of FIGS. 2 and 4. As seen in FIG. 19 a, workpiece column700 includes a pair of preprocess shelves 702 and a pair of postprocessshelves 704. In this regard, it should be appreciated that preprocesswafers are always moved from the front end to preprocess shelves 702 andpostprocess wafers are always moved from postprocess shelves 704 backinto the front end. Slit doors are indicated as being closed between thevarious chambers, as needed, using rectangles in the FIG. 18 series andusing cross-hatching in the FIG. 19 series. For example, slit doors 706and 708 are open in FIGS. 18 a-d and FIGS. 19-a-g and 19 l, while beingshown as closed in FIG. 18 e and FIGS. 19 h-k. FIGS. 18 b, 18 d and 18e, as well as FIGS. 19 c, 19 d and 19 g-l further illustrate the swingarm arrangement in a home or parked position at some point duringongoing operation of the system, as will be further described.

Turning to FIG. 18 a in conjunction with FIG. 19 a, the latter figure,as is the case with all of the figures in the FIG. 19 series, is anelevational view of system 10 having workpiece column 700 shown at theleft and process stations 26 at the right in the view of the figure. Anupper swing arm pair, as previously described with regard to FIG. 5 a,includes swing arms 128 a and 128 b, for use in moving preprocess waferswhile a lower swing arm pair includes swing arms 130 a and 130 b, foruse in moving postprocess wafers. Upper swing arms 128 are rotated toworkpiece column 700 while lower swing arms 130 are rotated to processstations 26. In FIG. 19 a, upper swing arms 128 are poised to lift apair of preprocess wafers 710 from preprocess shelves 702 while swingarms 130 are concurrently poised to lift a pair of postprocess wafers712 at process stations 26 a and 26 b. It is noted that elevation 4 inFIGS. 8 and 9 produces this swing arm height. Postprocess wafers 712 aresupported at different, spaced apart heights h1 and h2, respectively,above the process stations by first and second sets of lift pins 716 and718 such that lower swing arms 130 are poised to pick postprocess wafers712 from the lift pins.

Referring to FIG. 18 a, it should be appreciated that the preprocess andpostprocess wafers are moved along first and second arcuate,semicircular transfer paths 720 and 722, indicated by dashed lines,between workpiece column 700 and process stations 26. It is of interestthat paths 720 intersect at workpiece column 700, but cross one another,thereby intersecting again, near the process stations. An angle γrepresents the rotation of each swing arm from a home position,corresponding to the position of a dashed line 724, along paths 720 and722. Thus, the full travel of each swing arm between workpiece column700 and its associated process station 26 is 2γ. It is of furtherinterest that the wafer column, pivot axes of the two swing armarrangements and the two process stations cooperatively define apentagonal shape. An uppermost shelf of shelf arrangement 64 ispartially visible, comprising one long blade 66 and one short blade 68(also see FIG. 2). These blades are arranged in a way that accommodatesa particular angle of entry by the swing arm that services a particularshelf so as to avoid interference therebetween. In the present example,upper swing arm 128 a accesses the uppermost shelf. Short blade 68 istherefore positioned on the left side of the shelf arrangement, in theview of the figure to prevent interference with end effector 142 a ofupper swing arm 128 a. Since upper swing arm 128 b swings-in from anopposite direction with respect to upper swing arm 128 a, the shelfblades are reversed for its associated shelf, as can best be observed inFIG. 2. Thus, the shelf blade configuration is customized in view of theapproach angle of each accessing swing arm.

In FIG. 19 b, swing arm pairs 124 a and 124 b have executed an upwardvertical motion, using lift motor 152 of FIG. 5 a, so as to use upperswing arms 128 to lift preprocess wafers 710 off of preprocess shelves702, while using lower swing arms 130 to lift postprocess wafers 712 offof lift pins 716 and 718. It is noted that rotation of cam plates 242 aand 242 b of FIGS. 8 and 9, respectively, from elevation 4 to elevation1 produces this upward vertical movement.

Turning to FIGS. 18 b and 19 c, swing arms 128 a, 128 b, 130 a and 130 ball rotate simultaneously to the home on such that preprocess wafers 710and postprocess wafers 712 are in a spaced apart vertical relationship(FIG. 19 c), but only the preprocess wafers are visible in the view ofFIG. 18 b. Cam plates 242 a and 242 b of FIGS. 8 and 9, respectively,remain at elevation 1.

Referring to FIG. 19 d in conjunction with FIG. 18 b, while the swingarms remain in the parked position, a downward vertical movement in adirection indicated by an arrow 730 is executed, responsive to liftmotor 152 of FIG. 5 a. It is noted that lift pins 716 and 718 can remainin their “up” position, as also shown in FIG. 19 c. It is noted thatrotation of cam plates 242 a and 242 b of FIGS. 8 and 9, respectively,from elevation 1 to elevation 2 produces this downward verticalmovement.

FIGS. 18 c and 19 e, cooperatively illustrate the result of rotation oflower swing arms 130 a and 130 b to wafer column 700 to deliver postprocess wafers 712 while upper swing arms 128 a and 128 b each deliverone preprocess wafer 710 to one of process stations 26 a and 26 b. Liftpins 716 and 718 can remain in their up positions, while cam plates 242a and 242 b of FIGS. 8 and 9 remain oriented at elevation 2.

In FIG. 19 f, the swing arm arrangement is moved downward in a directionindicated by an arrow 740 to place preprocess wafers 710 on lift pins716 and 718 while postprocess wafers 712 are placed on postprocessshelves 704. It is noted that rotation of cam plates 242 a and 242 b ofFIGS. 8 and 9, respectively, from elevation 2 to elevation 3 producesthis downward vertical movement. Further, returning post-processworkpieces entails a reversal of rotation of cam plates 242 a and 242 b,as will be evident to one having ordinary skill in the art in view ofthe foregoing disclosure.

FIGS. 18 d and 19 g illustrate swing arms 128 a, 128 b, 130 a and 130 b,then rotated to the home position. At this point, the swing arms are notcarrying wafers and lift pins 716 and 718 remain raised to supportpreprocess wafers 710.

Referring to FIGS. 18 e and 19 h, it is noted that the former figureillustrates a front end robot 750 that is configured for moving wafersbetween loadlock 20, FOUPs 18 and intermediate station 21 (FIG. 1 b) inthe front end. It is noted that intermediate station 21 can be used fora variety of different functions including a cooling station, a waferalignment station, a pre- and/or post process metrology station or twoor more functions can be incorporated into this space. The front endrobot arm supports a pair of wafers, using an over/under pair ofpaddles, and is configured for placing on preprocess shelves 702 andpicking from post process shelves 704. Of course, the front end robotarm can pick and place from any pair of adjacent positions or from anyindividual position in any FOUP or any position in cooling station 21(FIG. 1 b). In the present example, front end robot 750 is poised todeliver a new pair of preprocess wafers 710′ (FIG. 8 e) at atmosphericpressure to preprocess shelves 702. In this regard, a suitable doorconfiguration is used between front end 12 and loadlock 20, which is notshown since such door configurations are known. It is sufficient to saythat this door must be in an open position before the front end robotcan enter loadlock 20. FIG. 19 h illustrates that lift pins 716 and 718have been lowered to place preprocess wafers 710 on their respectiveprocess stations. Both FIGS. 18 e and 19 h illustrate slit doors 706 and708 as closed for the processing mode. It should be appreciated that therelationship between these various events, as well as the actualinitiation of processing, may be changed in many suitable ways in timedrelation to one another. Processing then proceeds so as to transform thepreprocess wafers into postprocess wafers 712 at process stations 26 aand 26 b.

Referring briefly to FIGS. 1 a and 1 b, with regard to front end robot750, it is noted that, while two wafers can be transferred at the sametime, the robot readily accommodates the transfer of the 25th wafer in a25 wafer FOUP singularly by using independent motion of its over/underpaddles. Moreover, this robot is inherently flexible in readilyaccommodating a variety of wafer positions within the FOUPs and coolingstation 21, for example, when not all FOUP's come in fully loaded, sinceone or two wafers are selectively transferred at a time. That is, robot750 may readily pick one wafer from one FOUP and another wafer fromanother FOUP, if necessary, using independent paddle motion, in order toenhance system throughput. The converse is likewise true for placingwafers in the FOUPs.

Referring to FIG. 19 i, during processing, front end robot 750 places anew pair of preprocess wafers 710 onto preprocess shelves 702. At thistime, the postprocess and preprocess shelves of wafer column 700 are allfilled.

Referring to FIG. 19 j, immediately after placing the new preprocesswafers, front end robot 750 picks postprocess wafers 712 frompostprocess shelves 704. It should be appreciated that this movementfrom dropping off the new preprocess wafers to immediately picking upthe postprocess wafers can be executed very quickly, if mandated by arelatively short process time and, therefore, may be referred to as a“fast wafer swap.”

In FIG. 19 k, the system is ready for the conclusion of processing withempty postprocess shelves 704 and with the new pair of preprocess wafers710′ waiting on preprocess shelves 702. Wafers at the process stationsare indicated as transformed to post process wafers.

FIG. 19 l, illustrates the conclusion of processing, with the slit doorsopened and newly processed wafers 712 raised by lift pins 716 and 718.The next step is essentially identical to that of previously describedFIG. 19 a such that the processing cycle may repeat as necessary.

Having described system 10 in detail above, as well as its method ofoperation, at this juncture, is appropriate to discuss certainadvantages that it provides, particularly with respect to systemthroughput in the instance of relatively short processing times. Whenprocessing times are short, it is important to effectuate transfer ofworkpieces in a way that does not add overhead time to the overall timewhich is required to process a workpiece. That is, overhead time duringwhich workpieces are being transferred without concurrent exposure ofworkpieces to the treatment process. In this regard, it should beappreciated that system 10 transfers processed workpieces out of theprocessed chambers simultaneous with transferring new preprocessworkpieces to the process chamber. When the processed workpieces arriveat the loadlock, preprocess workpieces simultaneously arrive at theprocess chamber. Moreover, this transfer is accomplished in a rapidmanner. For example, transfer times on the order of less thanapproximately 8 seconds are contemplated. At the same time, it should beappreciated that the use of a workpiece column in the loadlock providesfor what may be referred to as a mini loadlock. That is, the loadlockvolume is so limited as to provide for rapid pump down from atmosphericpressure to an intermediate pressure or to the treatment pressureitself. For example, a loadlock volume of approximately 20 liters iscontemplated. Loadlock pumpdown times of approximately 10 seconds orless are contemplated.

Referring again to FIG. 3, as mentioned previously, pump down ofloadlock 20 is accomplished through ports 87, only one of which isvisible in the view of FIG. 3. Since such a rapid pump down isfacilitated, at least in part, due to the small volume of the loadlock,is recommended to use as dry an ambient as possible when the loadlock isin communication with the front end. In this way, flash condensation ofwater vapor may be avoided. Moreover, purge ports 89, only one of whichis visible, may be used to present a constant curtain of gas flow whenthe loadlock is in communication with the front end, to prevent mixingof ambient front end gasses with those gasses that are present in theloadlock. Thus, a pump and purge routine may be used to avoid such gasmixing at any time the door is open between the loadlock and front end,whereby gasses entering through purge ports 89 flow through the loadlockand are immediately evacuated through pump ports 87. This is attended bythe further advantage, briefly described above, that contaminants willflow into trough 87 and are evacuated, as a result of pumping from thislow lying region of the loadlock.

Referring to FIG. 20, system 10 is diagrammatically illustrated withoutfront end 12, in a plan view for purposes of describing a feature whichis advantageous with respect to process station spacing. That is, thedistance between the center of one process station to the center of theother process station. For purposes of clarity, only swing arm pair 124b has been illustrated, although it is to be understood that the presentdiscussion is equally applicable with respect to the other swing armpair. It is noted that FIG. 20 diagrammatically illustrates swing armarrangement 120 with respect to counterrotation, however, its fullsymmetric movement capabilities are seen, for example, in FIGS. 18 a-e.In the present example, process stations 26 a and 26 b are shown spacedapart by a distance S1. It may be desired, however, to change thisspacing, for example, by increasing the spacing such that the spacedapart distance between processing stations 26 a′ and 26 b′ is increasedto a distance S2. This change is readily accommodated by system 10, aswill be described immediately hereinafter.

Turning to FIG. 5 a in conjunction with FIG. 20, as described above, itis noted that upper swing arm 128 a is clamped to the inner swing armdrive shaft while lower swing arm 130 a is pinned or fixedly attached tothe outer swing arm drive shaft. In order to accommodate any givenprocess station to process station spacing or change thereof, lowerswing arm 130 a is initially fully rotated in the direction of theprocess stations, using motor 310. Housing 176, shown in FIG. 5 a, canthen be rotated in a way which allows for positioning lowermost swingarm 130 a at an associated one of processing stations such as 26 a′.Housing 176 is then fixed in position. Having accomplished thispositioning and with upper swing arm 128 a unclamped from the innerswing arm drive shaft, upper swing arm 128 a is freely rotated to itsdesired position at wafer column 700. The upper swing arm is thenclamped to the inner swing arm shaft. As a result of the counterrotation of the upper and lower swing arms, the home position will beangularly displaced by an amount that is equal to one half of theadditional rotation that is introduced in the swing arm paths betweenthe wafer column and the respective process stations. In FIG. 20, if theincreased rotation is given as an angle δ, the home position ofworkpiece column 700 will be rotationally displaced by one half δ towardthe process stations. Of course, if the swing arm length is changed, thewafer column position will change accordingly. Shelf arrangement 64 canaccommodate minor changes in swing arm length, as is. Greater changes,however, will necessitate movement of the shelf position within loadlock20 along a line 802 that bisects and is normal to a process station toprocess station 804.

As another advantage of system 10, dual wafer delivery capabilities areprovided using only a single wafer load/unload lock style architecture.This provides significantly reduced transfer chamber size and simplifiesthe mechanics associated with wafer exchange. The loadlock design allowsfor rapid atmospheric wafer exchanges which are facilitated through thedescribed independent over/under robot paddles of the front end robot.This, in turn, is inherently flexible with small lots often confrontedin FOUP based processing. A small volume loadlock allows for fastventing and pumping; imperative to high system throughput capability.Vacuum based transfer couples both the loadlock and process module waferexchanges into common motions; eliminating the need for additionaldelays due to sequencing, and minimizing wafer exchange times. A“mini-batch” processing technology can be employed (side-by-side waferprocessing), while reducing the physical size and costs associated withwafer handling technology. In this regard, the transfer chamber is alsoof a relatively small size. As a further advantage, during atmosphericloadlock exchange, two new wafers are placed simultaneously by the frontend robot, which then removes the previously processed wafers. Thisexchange of wafers happens very quickly and, when coupled with fast ventand pump times associated with the reduced loadlock volume, allows fornearly invisible handling overhead. Indeed, the platform's main goal forhigh throughput capability is to mask all time associated with waferreplenishment entirely within the time required to process the otherwafers. The result is thought to be a truly continuous processingcapable system. As still a further advantage, the arrangement ofopposing dual swing arms provide a trajectory which allows single wafertype load/unload lock architecture to efficiently accommodate side byside wafer processing geometry with a significantly smaller footprintthan that embodied by prior designs.

As will be brought to light with reference to a number of specificexamples to be described immediately hereinafter, the concepts taughtherein may be embodied by a wide variety of alternative systemconfigurations and arrangements, all of which are considered to fallwithin the scope of the present invention.

Attention is immediately directed to FIG. 21 which diagrammaticallyillustrates a processing arrangement that is generally indicated by thereference number 800. It is noted that FIG. 21 diagrammaticallyillustrates swing arm arrangement 120 with respect to counterrotation,however, its full symmetric movement capabilities are seen, for example,in FIGS. 18 a-e. Processing arrangement 800 includes first and secondprocessing chambers 802 and 804, respectively. This system furtherincludes swing arm arrangement 120 with dual swing arm assemblies 124 aand 124 b. A loadlock 810 is provided which houses wafer column 700.Processing chambers 802 and 804, along with loadlock 810 are housedwithin an overall chamber 812. It is noted that any number of valvearrangements may be utilized for interfacing the various chambersutilized by processing arrangement 800 including, for example, onedescribed in FIGS. 3 and 4 of U.S. Pat. No. 6,429,139 that is used inconjunction with arcuate chamber walls. Accordingly, such descriptionswill not be repeated herein for purposes of brevity.

Still referring to FIG. 21, it should be appreciated that swing armarrangements 124 a and 124 b can move synchronously, as described above,while processing chambers 802 and 804 are both in use. As analternative, however, one swing arm arrangement can be disabled withrespect to its rotational motion, for example, by turning off itsrotational drive motor such that the swing arm assembly remains in itshome position, while the other swing arm assembly remains fullyoperational. The disengaged swing arm assembly will continue to movevertically, as it normally would, with the operating swing arm assemblysuch that there is no interference between the two swing arm assemblies.The particular processing chamber that is associated with the disengagedswing arm assembly may be configured so that its utilities can beisolated from the rest of the system (i.e., turned off) such that theparticular processing chamber can be serviced while the other processingchamber remains completely operational. This feature is considered to behighly advantageous, in and by itself.

Referring to FIG. 22, another embodiment of a system, produced inaccordance with the present invention, is generally indicated by thereference number 1000. System 1000 shares the advantages of system 10while providing still further advantages. This system uses waferhandling section 15 and processing section 16 in conjunction with afront end 1002. The latter includes an elongated transport chamber 1004which houses a transport mechanism 1006 in the form of a linear drivefor moving workpieces as indicated by arrow 1007. One suitable form oflinear drive comprises a magnetic levitation linear drive, although anysuitable type may be employed. A loadlock 1010 is stationed at one endof transport chamber 1004 for communication with the interior of thetransport chamber through a door 1111. In this regard, it should beappreciated that transport chamber 1004 can operate at process pressure.Loadlock 1010 is, in turn, configured for communication with anatmospheric mini environment 1012 through a door 1114. Mini environment1012 is not shown in detail, since its general details of constructionwill be evident to those having ordinary skill in the art in view of theforegoing discussions, but which may include, for example, a front endrobot and ports for any suitable number of FOUPs. Door 1111 and door1114 may be of any suitable type including, but not limited to slotvalves of the type previously described with respect to the FIG. 17series, depending on the configuration provided for the transport ofworkpieces therethrough, as will be further described.

Still referring to FIG. 22, in one embodiment, transport mechanism 1006is configured for moving a workpiece carrier 1118 therealong whichsupports one or more workpiece columns. Carrier 1118 is shown stationedfor access by swing arm arrangement 120 b, designated as a workpiececolumn 700 a supported by transport 1006 and, in phantom, designated asa workpiece column 700 b. Each of these workpiece columns resemblespreviously described workpiece column 700 with the difference that eachworkpiece column is portable, as will be further described. It should beappreciated that carrier 1118 supports previously described shelfarrangement 64 for access by swing arm arrangements 120 a and 120 b.

Still referring to FIG. 22, when using a portable workpiece carrier,door 1111 may comprise any suitable door arrangement. A front end robot(which may be identical to front end robot 750 of FIG. 18 e), formingpart of front end 1012, may access the portable workpiece carrier at 700b′ through door 1114 in a manner that is essentially identical to thatdescribed with respect to system 10 by moving the workpiece carrier tolocation 700 b′. Specifically, the front end robot may have independentover/under paddles that can be used for a four position workpiececolumn. This location may also include a rotatable shelf arrangement forconfronting either door 1114 for front end access or door 1111 forlinear transport mechanism 1006 access. Alternatively, door 1114 may beconfigured for moving an entire workpiece column or workpiece carriertherethrough with the use of appropriate front end robotics. In thisway, a fresh, preprocess workpiece column can enter through loadlock1010 while another loadlock (not shown but at an opposing end oftransport 1006) can be used by the front end to retrieve a postprocessworkpiece column. Workpiece columns 700 a and 700 b are shownselectively aligned with transfer chambers 22 b and 22 a, respectively.It should be appreciated that more than one portable workpiece carriercan be used at a time so that, with workpiece columns 700 a and 700 bpositioned as shown, transfer of workpieces to and from these columnscan proceed as described above with respect to system 10. Fordescriptive purposes, one transfer chamber in combination with oneprocess chamber may be referred to as a process platform. Accordingly,in the present example, process platforms 1120 and 1122 are provided. Aworkpiece column 700 a′ comprises a location to which the portableworkpiece carrier can be moved, serving, for example, as a coolingand/or buffer station. The buffer/cooling station can be configured torotate 180 degrees, depending on requirements, for access from lineartransport 1006 and wafer carrier 1118. It is noted that this maycomprise another loadlock location, as mentioned above, and withappropriate valves, so as to appear essentially the same as loadlock1010, in order to increase system throughput, if the reduced systemoverhead time coupled with process time requirements warrants such afeature. Accordingly, the advantages that are attributable to the use ofa stationary workpiece column in the loadlock are also provided bysystem 1000, while still further advantages are provided through makingthis workpiece column portable. Moreover, when process chamber 24 a isused to practice a different process than process chamber 24 b, theconfiguration of system 1000 provides the further advantage of allowingfor sequential processing, without the need to break vacuum.

Turning now to FIG. 23, another embodiment of a system, produced inaccordance with the present invention is generally indicated by thereference number 1200. It is noted that, throughout appropriate ones ofthe remaining figures, swing arm arrangement 120 is illustrated withrespect to counterrotation, however, its full symmetric movementcapabilities are described in detail above and can be seen, for example,in FIGS. 18 a-e. System 1200 includes a modified front end 1012′ havinga loadlock access door 1114 centered on one side thereof. A modifiedtransport chamber 1004′ includes a modified loadlock 1010′ having doors1114 and 1111 arranged on opposing sides thereof so as to confront frontend 1012′ and transport chamber 1004′, respectively. Workpiece column700 a is illustrated in loadlock 1010′ such that it can be accessed fromthe front end using the front end robot, or it can be moved intotransport chamber 1004′. Workpiece column 700 b and carrier 1118 areillustrated in an aligned position with process platforms 1120 and 1122.In this configuration, either process platform can move workpieces toand from this workpiece column using swing arm arrangements 120 a and120 b. A cooling and/or buffer station (see FIG. 22, can readily beprovided. In one implementation, a suitable arrangement may be providedfor elevating a workpiece column, for example, from loadlock 1010′ orfrom a cooling/buffer station such that multiple workpiece columns canbe arranged in a stacked relationship. In this regard, a “second story”can be added to transport chamber 1004′ and to loadlock 1010′ to providefor a high degree of flexibility with respect to movement of workpiececolumn carriers in this system. It should be noted that system 1200 isalso advantageous with respect to providing the capability forperforming sequential processing steps without the need to break vacuum.That is, as is also the case with system 1000 and other systems yet tobe described, platform 1120 may be used to execute a first process step.After having been exposed to this first process step, workpieces maythen be transported to platform 1122 for exposure to a second processstep.

Referring to FIGS. 24 a-d in conjunction with FIG. 23, further detailswill now be provided with respect to linear transport 1006, as shown inFIG. 23, although it is to be understood that these concepts can applyto any linear transport and/or rotatable wafer column used herein. FIG.24 a illustrates workpiece carrier 1118, which may itself be a robotwith rotation and extension capability, supported by linear transport1006 rotated to confront platform 1122 to receive/handoff workpieceswith this platform.

FIG. 24 b illustrates workpiece carrier 1118 rotated to a “neutral”position, in preparation for exchanging workpieces with loadlock 1010′.

In FIG. 24 c, workpiece carrier 1118 is moving wafer column 700 b intoloadlock 1010′ for access by front end 1012′ of FIG. 23 with door 1111in an open position. It is noted that linear movement is facilitated, asindicated by arrows 1123.

FIG. 24 d illustrates workpiece carrier 1118 rotated to confrontplatform 1120 (FIG. 23) to receive/handoff workpieces with thisplatform.

Turning now to FIG. 25, attention is directed to still anotheralternative system configuration that is generally indicated by thereference number 1300. It should be appreciated that much of theforegoing discussion with respect to alternative embodiments is equallyapplicable with respect to system 1300. For this reason, some detailswill not be repeated for purposes of brevity. System 1300 placesprocessing platforms 1120 and 1122 in a side-by-side relationship foraccess using a transport chamber 1004″, in a manner that is similar tothat of previously described system 1000. In this case, however, frontend 1012′ has been rotated 90° and arranged for communication withloadlock 1010′ through a door 1114. As illustrated, workpiece columns700 a-700 d can be used in the system. Workpiece column 700 a isstationed in loadlock 1010′, workpiece column 700 b is stationed foraccess by platform 1120, workpiece column 700 c is stationed for accessby platform 1122 and workpiece column 700 d is positioned outward ofworkpiece column 700 c at what may be a cooling and/or buffer station.Workpiece carrier 1118 is shown supporting workpiece column 700 c and,in phantom, supporting workpiece column 700 a. Again, sequentialprocessing may be performed without the need to break vacuum.

Referring to FIG. 26, yet another alternative system configuration isgenerally indicated by the reference number 1400. System 1400 representsa combination of previously described systems 1200 and 1300.Specifically, transport chamber 1004″, of FIG. 25, has been utilizedwith platforms 1120 and 1122 positioned side-by-side on one side of thetransport chamber, while, on the other side of the transport chamber,platforms 1120′ and 1122′ are stationed side-by-side in a confrontingrelationship with the platforms on the opposite side of the transportchamber. Accordingly, system 1400 shares all of the advantages ofsystems 1200 and 1300 so as to provide for robust workpiece processingcapabilities.

With reference to FIG. 27, an additional alternative systemconfiguration is generally indicated by the reference number 1500.System 1500 shares a number of aspects of its configuration with system1400 of FIG. 26, with exceptions to be noted. In the present example, atransport chamber 1502 houses a linear drive 1504 in the form of a minirobot. The latter includes a paddle assembly 1506 which may beconfigured with over/under paddles, as described above, for purposes oftransporting one or two workpieces at a time. A paddle assembly oflinear drive 1504 is shown at a lower position, in the present view,such that its paddle blades are positioned within loadlock 1010′. Abuffer station 1510 is located at the uppermost end of the linear drive,in the present example. The buffer station may include, for example,from 1-30 workpiece positions. Some of the workpiece buffer positionscan be used to store test workpieces for process set up and/orcalibration. It is of interest to note that the pivot axes of swing armarrangements 120 a-120 d are now located in transport chamber 1502.Further, the transport chamber may be held at process pressure, if sodesired. Slit doors 1512 (only one of which is identified) are providedwhich may utilize any suitable valve arrangement such as, for example,valve arrangement 80, as described above. Accordingly, as is the casewith other systems described above, sequential or parallel processingcan be accomplished using this system.

Still referring to FIG. 27, in one modification of system 1500, loadlock1010′ is not required. That is, door 1111 can be eliminated such thatthe illustrated loadlock volume becomes part of the transport chamber.Thus, this lower illustrated position of mini robot 1506 can server as abuffer station or for other appropriate purposes. It should beappreciated that the present invention contemplates systemconfigurations that are driven by process parameters. In particular, asmall volume loadlock is highly advantageous in the instance of a fastprocess time, wherein a fast process time would be less than or on theorder of a given overhead time required to transport one or moreworkpieces, including pumping times. On the other hand, slow processtimes may serve to eliminate the need for a loadlock, wherebyconfigurations such as is illustrated in FIG. 27 become useful. That is,a slow process time is of a length which is generally longer than thetime period that is required for wafer transport. In this sense, thereis no overhead time, if the latter is viewed as time devoted to wafertransport while a processing station is inactive.

Turning now to FIG. 28, a further embodiment of a system that isconfigured in accordance with the present invention is generallyindicated by the reference number 1600. It is noted that system 1600includes an overall configuration which resembles system 1200 of FIG.23, described above. Accordingly, the present discussion will be limitedto certain differences between these two systems. In particular, theside-by-side common processing environment of FIG. 23 has been replacedby a pair of separate processing chambers 1602 and 1604, designated with“a” and “b” appended in the Figure. Each of these chambers is capable ofperforming a process that is isolated from the other chamber. Thus, afirst process can be performed in chamber 1602 while a second process isperformed in chamber 1604 in a sequential processing environment,although this is not a requirement. Accordingly, each of the processchambers is located within the transfer chamber and is isolatablethereform, for example, using a vertically movable process chamber slitdoor 1606, as described in above incorporated U.S. Pat. No. 6,429,139.It should be noted that this embodiment shares advantages with theembodiment of FIG. 21. In particular, one process chamber, andassociated, swing arm arrangement can continue to operate while theother process chamber undergoes servicing or maintenance.

Although each of the aforedescribed physical embodiments have beenillustrated with various components having particular respectiveorientations, it should be understood that the present invention maytake on a variety of specific configurations with the various componentsbeing located in a wide variety of positions and mutual orientations.Furthermore, the methods described herein may be modified in anunlimited number of ways, for example, by reordering, modifying andrecombining the various steps. Accordingly, it should be apparent thatthe arrangements and associated methods disclosed herein may be providedin a variety of different configurations and modified in an unlimitednumber of different ways, and that the present invention may be embodiedin many other specific forms without departing from the spirit or scopeof the invention. Therefore, the present examples and methods are to beconsidered as illustrative and not restrictive, and the invention is notto be limited to the details given herein.

1. In a workpiece processing system in which a plurality of workpiecesare movable to and from a process chamber arrangement, said processchamber arrangement using at least two side-by-side, first and secondprocess stations each of which is configured for executing a treatmentprocess on one of the workpieces located at each of the first and secondprocess stations such that two workpieces can simultaneously be exposedto the treatment process, an apparatus comprising: a workpiece supportarrangement, separate from said process chamber arrangement, forsupporting at least two of said workpieces at least generally in astacked relationship to form a workpiece column; and a workpiecetransfer arrangement, separate from said process chamber arrangement,for transporting at least two of the workpieces between the workpiececolumn and the process chamber arrangement by simultaneously moving thetwo workpieces at least generally along first and second transfer paths,respectively, that are defined between said workpiece column and thefirst and second process stations.
 2. The apparatus of claim 1 whereinsaid two workpieces are moved unidirectionally along said first andsecond transfer paths between the process chamber arrangement and theworkpiece column.
 3. The apparatus of claim 1 wherein said workpiecetransfer arrangement is configured for using rotation to move the twoworkpieces between the workpiece column and each of the first and secondprocess stations along said first and second transfer paths such that arotational component of movement between the workpiece column and thefirst and second process stations generally characterizes the first andsecond transfer paths.
 4. The apparatus of claim 3 wherein the first andsecond transfer paths at least partially overlap when projected onto aplane that is generally parallel to said rotational component ofmovement.
 5. The apparatus of claim 3 wherein the first and secondtransfer paths provide for one confronting relationship between the twoworkpieces at the workpiece column and provide for moving the twoworkpieces through another confronting relationship at a positionbetween the workpiece columns and the process chamber arrangement. 6.The apparatus of claim 1 wherein said system includes a loadlock and atransfer chamber such that said workpieces are movable between theprocess chamber arrangement and the loadlock through the transferchamber and said wafer column is located in said loadlock while theworkpiece transfer arrangement is supported in the transfer chamber. 7.The apparatus of claim 1 wherein said workpiece transfer arrangement isconfigured for simultaneously transferring two pre-treatment ones of theworkpieces from the workpiece column to the first and second processstations while returning two post-treatment ones of the workpieces fromthe first and second process stations to the workpiece column.
 8. Theapparatus of claim 7 wherein at any given time during transfer of thepre-treatment and post-treatment workpieces, the workpiece transferarrangement supports the pre-treatment and post-treatment workpieces ina vertically spaced-apart positional relationship along the first andsecond transfer paths.
 9. The apparatus of claim 7 wherein saidworkpiece transfer arrangement includes first and second sets of swingarms, each of the swing arm sets including an upper swing arm and alower swing arm that pivot coaxially so as to collectively provide apair of upper swing arms and a pair of lower swing arms, and the upperswing arm pair is configured to move said workpieces in one directionbetween the workpiece column and the side-by-side process stations whilethe lower swing arm pair is configured to move said workpieces in anopposite direction between the workpiece column and the side-by sideprocess stations.
 10. The apparatus of claim 9 wherein each of the firstand second swing arm sets is configured for vertical translation toelevationally change the first and second transfer paths between theworkpiece column and the first and second process stations.
 11. Theapparatus of claim 10 including a first cam, associated with said firstswing arm set, and a second cam, associated with said second swing armset, for providing a selectable elevation of each of the first andsecond swing arm sets in relation to rotation between the wafer columnand the process chamber arrangement.
 12. The apparatus of claim 9wherein said workpiece column includes a pair of pre-treatment workpiecepositions for receiving two pre-treatment workpieces and a pair ofpost-treatment workpiece positions for receiving two post-treatmentworkpieces and the upper swing arm pair is dedicated to moving the twopre-treatment workpieces from the pair of pre-treatment positions in theworkpiece column to the first and second process stations and the lowerswing arm pair is dedicated to moving the two post-treatment workpiecesfrom the first and second process stations to the pair of post-treatmentworkpiece positions in the workpiece column.
 13. The apparatus of claim9 wherein said workpiece column includes a pair of pre-treatmentworkpiece positions for receiving two pre-treatment workpieces and apair of post-treatment workpiece positions for receiving twopost-treatment workpieces and the upper swing arm pair is dedicated tomoving the two post-treatment workpieces from the first and secondprocess stations to the pair of post-treatment positions in theworkpiece column and the lower swing arm pair is dedicated to moving thetwo pre-treatment workpieces from the pair of pre-treatment workpiecepositions in the workpiece column to the first and second processstations.
 14. The apparatus of claim 9 wherein the upper swing arm andthe lower swing arm of each swing arm set are moved in a way whichcauses the upper swing arm to arrive at a particular one of the processstations when the lower swing arm arrives at the workpiece column and,when rotated oppositely, to cause the upper swing arm to arrive at theworkpiece column when the lower swing arm arrives at the particular oneof the process stations.
 15. The apparatus of claim 9 wherein the upperswing arm and the lower swing arm, making up each set of swing arms, arecounter-rotating with respect to one another so as to move in oppositedirections simultaneously between the process chamber arrangement andthe workpiece column.
 16. The apparatus of claim 15 wherein said firstand second sets of swing arms are rotated using first and second motors,respectively, such that an individual motor rotationally drives each setof swing arms.
 17. The apparatus of claim 16 including an arrangementfor synchronizing rotation of said first and second motors such that theupper pair of swing arms arrives at one of the process chamberarrangement and the workpiece column substantially at the same time thatthe lower pair of swing arms arrives at the other one of the processchamber arrangement and the workpiece column.
 18. The apparatus of claim7 wherein said workpiece transfer arrangement includes first and secondsets of swing arms, each of the swing arm sets including an upper swingarm and a lower swing arm that pivot coaxially so as to collectivelyprovide a pair of upper swing arms and a pair of lower swing arms andconfigured for using one of the upper swing arm pair and the lower swingarm pair for moving the pre-treatment ones of the workpiecessimultaneously from the workpiece column to the side-by-side processstations and for using the other one of the upper swing arm pair and thelower swing arm pair for moving the post-treatment ones of theworkpieces simultaneously from the side-by-side process stations to theworkpiece column.
 19. The apparatus of claim 18 wherein each one of theupper and lower swing arms of the first and second swing arm sets isconfigured for transitioning from a first elevational plane of movementto a second elevational plane of movement in moving between saidworkpiece column and said process chamber arrangement along said firstand second transfer paths such that the first and second planes ofmovement are vertically spaced apart.
 20. The apparatus of claim 18wherein the first and second swing arm sets cooperate to simultaneouslypick the pre-treatment ones of said workpieces from said wafer column.21. The apparatus of claim 20 wherein the first and second swing armsets cooperate to simultaneously pick the post-treatment ones of saidworkpieces from the first and second process stations as thepre-treatment ones of the workpieces are picked from the wafer column.22. The apparatus of claim 20 wherein a first pre-treatment workpieceand a second pre-treatment workpiece are picked at a selected verticaloffset from one another and said first and second swing arm sets areconfigured for moving the first and second pre-treatment workpieces tothe first and second processing stations while maintaining said verticaloffset such that the first and second workpieces arrive at the first andsecond process stations at a first height and a second height, differingby said selected vertical offset.
 23. The apparatus of claim 22 whereinsaid process stations define a processing plane in which said workpiecesare processed and said workpiece transfer arrangement includes aworkpiece lifting arrangement for vertically moving the first and secondworkpieces between the processing plane and said first and secondheights, respectively, at the first and second process stations.
 24. Theapparatus of claim 18 wherein the lower swing arm of the first swing armset moves rotationally between the upper swing arm and lower swing armof the second swing arm set and the upper swing arm of the second swingarm set moves rotationally between the upper swing arm and lower swingarm of the first swing arm set.
 25. The apparatus of claim 1 whereinsaid first and second transfer paths separate in first and seconddirections from said workpiece column and said workpiece supportarrangement includes a shelf arrangement having a plurality of workpiecepositions and the shelf arrangement for each workpiece position isconfigured based on an association of said first and second directionsof travel with individual ones of the workpiece positions.
 26. Theapparatus of claim 25 wherein said workpiece positions are alternatelyassociated with said first and second transfer paths in said workpiececolumn.
 27. The apparatus of claim 1 wherein said workpieces aresemiconductor substrates.
 28. The apparatus of claim 1 wherein saidprocess chamber arrangement houses said first and second processstations in a common processing environment.
 29. The apparatus of claim1 wherein said process chamber arrangement includes a first processchamber for housing the first process station and a second processchamber, separate from the first process chamber, for housing the secondprocess station.
 30. In a workpiece processing system in which aplurality of workpieces are movable to and from a process chamberarrangement, said process chamber arrangement using at least twoside-by-side, first and second process stations each of which isconfigured for executing a treatment process on one of the workpieceslocated at each of the first and second process stations such that twoworkpieces can simultaneously be exposed to the treatment process, amethod comprising: arranging a workpiece support arrangement, separatefrom said process chamber arrangement, for supporting at least two ofsaid workpieces at least generally in a stacked relationship to form aworkpiece column; and supporting a workpiece transfer arrangement,separate from said process chamber arrangement, for transporting atleast two of the workpieces between the workpiece column and the processchamber arrangement by simultaneously moving the two workpieces at leastgenerally along first and second transfer paths, respectively, that aredefined between said workpiece column and the first and second processstations.
 31. The method of claim 30 including moving the two workpiecesunidirectionally along said first and second transfer paths between theprocess chamber arrangement and the workpiece column.
 32. The method ofclaim 30 including configuring said workpiece transfer arrangement forusing rotation to move the two workpieces between the workpiece columnand each of the first and second process stations along said first andsecond transfer paths such that a rotational component of movementbetween the workpiece column and the first and second process stationsgenerally characterizes the first and second transfer paths.
 33. Themethod of claim 32 wherein the first and second transfer paths at leastpartially overlap when projected onto a plane that is generally parallelto said rotational component of movement.
 34. The method of claim 32wherein the first and second transfer paths provide for one confrontingrelationship between the two workpieces at the workpiece column andfurther provide for moving the two workpieces through anotherconfronting relationship at a position between the workpiece columns andthe process chamber arrangement.
 35. The method of claim 30 wherein saidsystem includes a loadlock and a transfer chamber such that saidworkpieces are movable between the process chamber arrangement and theloadlock through the transfer chamber and said method includes locatingsaid wafer column in said loadlock while supporting the workpiecetransfer arrangement in the transfer chamber.
 36. The method of claim 30including configuring said workpiece transfer arrangement forsimultaneously transferring two pre-treatment ones of the workpiecesfrom the workpiece column to the first and second process stations whilereturning two post-treatment ones of the workpieces from the first andsecond process stations to the workpiece column.
 37. The method of claim36 wherein, at any given time during transfer of the pre-treatment andpost-treatment workpieces, using the workpiece transfer arrangement tosupport the pre-treatment and post-treatment workpieces in a verticallyspaced-apart positional relationship along the first and second transferpaths.
 38. The method of claim 36 including configuring said workpiecetransfer arrangement to include first and second sets of swing arms,each of the swing arm sets including an upper swing arm and a lowerswing arm that pivot coaxially so as to collectively provide a pair ofupper swing arms and a pair of lower swing arms, and the upper swing armpair is configured to move said workpieces in one direction between theworkpiece column and the side-by-side process stations while the lowerswing arm pair is configured to move said workpieces in an oppositedirection between the workpiece column and the side-by side processstations.
 39. The method of claim 38 including using each of the firstand second swing arm sets for vertical translation to elevationallychange the first and second transfer paths between the workpiece columnand the first and second process stations.
 40. The method of claim 39including providing a first cam, associated with said first swing armset, and a second cam, associated with said second swing arm set, toproduce a selectable elevation of each of the first and second swing armsets in relation to rotation between the wafer column and the processchamber arrangement.
 41. The method of claim 40 including arranging adrive shaft to interconnect said first and second cams for co-rotationthereof and further arranging an elevational control motor for drivingsaid drive shaft to selectively rotate the first and second cams which,thereby, vertically translates each swing arm.
 42. The method of claim38 including arranging said workpiece column to include a pair ofpre-treatment workpiece positions for receiving two pre-treatmentworkpieces and a pair of post-treatment workpiece positions forreceiving two post-treatment workpieces and dedicating the upper swingarm pair to moving the two pre-treatment workpieces from the pair ofpre-treatment positions in the workpiece column to the first and secondprocess stations and dedicating the lower swing arm pair to moving thetwo post-treatment workpieces from the first and second process stationsto the pair of post-treatment workpiece positions in the workpiececolumn.
 43. The method of claim 38 including configuring the upper swingarm and the lower swing arm, making up each set of swing arms, tocounter-rotate with respect to one another so as to move in oppositedirections simultaneously between the process chamber arrangement andthe workpiece column.
 44. The method of claim 43 including using a firstmotor and a second motor to rotationally drive said first and secondsets of swing arms.
 45. The method of claim 44 including synchronizingrotation of said first and second motors such that the upper pair ofswing arms arrives at one of the process chamber arrangement and theworkpiece column substantially at the same time that the lower pair ofswing arms arrives at the other one of the process chamber arrangementand the workpiece column.
 46. The method of claim 36 includingconfiguring said workpiece transfer arrangement to include first andsecond sets of swing arms, each of the swing arm sets including an upperswing arm and a lower swing arm that pivot coaxially so as tocollectively provide a pair of upper swing arms and a pair of lowerswing arms and further configured for using one of the upper swing armpair and the lower swing arm pair for moving the pre-treatment ones ofthe workpieces simultaneously from the workpiece column to theside-by-side process stations and for using the other one of the upperswing arm pair and the lower swing arm pair for moving thepost-treatment ones of the workpieces simultaneously from theside-by-side process stations to the workpiece column.
 47. The method ofclaim 46 including transitioning each one of the upper and lower swingarms of the first and second swing arm sets from a first elevationalplane of movement to a second elevational plane of movement in movingbetween said workpiece column and said process chamber arrangement alongsaid first and second transfer paths such that the first and secondplanes of movement are vertically spaced apart.
 48. The method of claim46 including using the first and second swing arm sets to simultaneouslypick the pre-treatment ones of said workpieces from said wafer column.49. The method of claim 48 including causing the first and second swingarm sets to simultaneously pick the post-treatment ones of saidworkpieces from the first and second process stations, as thepre-treatment ones of the workpieces are picked from the wafer column.50. The method of claim 48 wherein picking the pretreatment workpiecesincludes picking a first pre-treatment workpiece and a secondpre-treatment workpiece at a selected vertical offset from one anotherand configuring said first and second swing arm sets for moving thefirst and second pre-treatment workpieces to the first and secondprocessing stations while maintaining said selected vertical offset suchthat the first and second workpieces arrive at the first and secondprocess stations at a first height and a second height, differing bysaid vertical offset.
 51. The method of claim 50 wherein said processstations define a processing plane in which said workpieces areprocessed and configuring a workpiece lifting arrangement, as part ofsaid workpiece transfer arrangement, for vertically moving the first andsecond workpieces between the processing plane and said first and secondheights, respectively, at the first and second process stations.
 52. Themethod of claim 46 including rotationally moving the lower swing arm ofthe first swing arm set between the upper swing arm and lower swing armof the second swing arm set and rotationally moving the upper swing armof the second swing arm set between the upper swing arm and lower swingarm of the first swing arm set.
 53. The method of claim 30 includingseparating said first and second transfer paths in first and seconddirections from said workpiece column and providing a shelf arrangement,as part of said workpiece support arrangement, having a plurality ofworkpiece positions and configuring the shelf arrangement for eachworkpiece position based on an association of said first and seconddirections of travel with individual ones of the workpiece positions.54. The method of claim 53 including alternately associating saidworkpiece positions with said first and second transfer paths in saidworkpiece column.
 55. The method of claim 30 wherein said workpieces aresemiconductor substrates.
 56. The method of claim 30 wherein saidprocess chamber arrangement houses said first and second processstations in a common processing environment.
 57. The method of claim 30wherein said process chamber arrangement includes a first processchamber for housing the first process station and a second processchamber, separate from the first process chamber, for housing the secondprocess station and said method includes configuring the workpiecetransfer arrangement for simultaneously accessing the first and secondprocess chambers.
 58. In a workpiece processing system in which aplurality of workpieces are movable to and from a process chamberarrangement, said process chamber arrangement using at least twoside-by-side process stations, each of which is configured for treatingindividual ones of the workpieces located at each of the processstations such that at least two workpieces can simultaneously betreated, an apparatus comprising: a workpiece support arrangement,separate from said process chamber arrangement, for supporting at leasttwo of said workpieces at least generally in a stacked relationship toform a workpiece column; and a workpiece transfer arrangement, separatefrom said process chamber arrangement, at least for simultaneouslymoving two pre-treatment ones of the workpieces from said workpiececolumn to each of the side-by-side process stations.
 59. The apparatusof claim 58 wherein the pre-treatment workpieces are rotationally movedalong first and second rotational paths from the workpiece column to theside-by-side process stations.
 60. The apparatus of claim 58 whereinsaid first and second rotational paths define first and secondspaced-apart transport planes through which the first and secondworkpieces are rotated.
 61. The apparatus of claim 58 wherein saidworkpiece transfer arrangement is configured for moving twopost-treatment ones of the workpieces from said side-by-side processstations to the workpiece column simultaneous with the movement of thepre-treatment ones of the workpieces.
 62. In a workpiece processingsystem in which a plurality of workpieces are movable to and from aprocess chamber arrangement, said process chamber arrangement using atleast two side-by-side process stations each of which is configured fortreating individual ones of the workpieces located at each of theprocess stations such that at least two workpieces can simultaneously betreated, a method comprising: forming a workpiece column using aworkpiece support arrangement, separate from said process chamberarrangement, for supporting at least two of said workpieces at leastgenerally in a stacked relationship; and simultaneously moving twopre-treatment ones of the workpieces from said workpiece column to eachof the side-by-side process stations using a workpiece transferarrangement that is separate from said process chamber arrangement. 63.The method of claim 62 including rotationally moving the pre-treatmentworkpieces along first and second rotational paths from the workpiececolumn to the side-by-side process stations.
 64. The method of claim 62wherein rotationally moving rotates the first and second pre-treatmentworkpieces in first and second spaced-apart transport planes along thefirst and second rotational paths.
 65. The method of claim 62 includingconfiguring said workpiece transfer arrangement for moving twopost-treatment ones of the workpieces from said side-by-side processstations to the workpiece column simultaneous with the movement of thepre-treatment ones of the workpieces.
 66. In a workpiece processingsystem in which a plurality of workpieces are movable to and from aprocess chamber arrangement that is configured for executing a treatmentprocess on at least one of the workpieces, an apparatus comprising: aworkpiece support arrangement separate from said process chamberarrangement for supporting at least one of said workpieces for movementin relation to the process chamber arrangement; and a swing armarrangement, forming part of said system, including at least a firstswing arm for providing pivotal rotation of at least one workpiece aboutan axis of rotation, as part of transporting the workpiece between theworkpiece support arrangement and the process chamber arrangement, andfor moving in a direction that is at least generally along said axis ofrotation, as another part of transporting the workpiece, to change anelevation of the swing arm such that the workpiece being transported canbe moved between different spaced-apart elevational planes in additionto said pivotal rotation.
 67. The apparatus of claim 66 wherein saidfirst swing arm is configured for moving at least generally along saidaxis of rotation for at least one of picking and placing one of saidworkpieces at the workpiece support arrangement and the process chamberarrangement.
 68. The apparatus of claim 66 wherein said system includesa loadlock and a transfer chamber such that the workpiece beingtransported is movable between the process chamber arrangement and theloadlock through the transfer chamber and said workpiece supportarrangement is located in said loadlock while the swing arm arrangementis supported in the transfer chamber.
 69. The apparatus of claim 66wherein said swing arm arrangement includes a second swing arm that iscoaxial with the first swing arm, and each of which swing arms isconfigured to pivotally rotate about said axis of rotation.
 70. Theapparatus of claim 66 wherein said first swing arm includes a firstshaft member that is supported for rotation about said axis of rotationand having a first arm member extending transversely from the firstshaft member having a distal end that is configured for supporting oneof said workpieces and said first shaft member is supported fortranslational movement at least generally along said axis of rotation.71. The apparatus of claim 66 wherein said first swing arm includes afirst shaft member and a first arm member extending transverselytherefrom, having a first distal end for supporting a first one of saidworkpieces and the swing arm arrangement further includes a second swingarm includes a second shaft member and a second arm member extendingtransversely therefrom having a second distal end for supporting asecond one of the workpieces and said second shaft member defines athrough opening that is arranged along said axis of rotation forcoaxially receiving the first shaft member of the first swing arm. 72.In a workpiece processing system in which a plurality of workpieces aremovable to and from a process chamber arrangement that is configured forexecuting a treatment process on at least one of the workpieces, anapparatus comprising: a swing arm arrangement, forming part of saidsystem, including at least a first swing arm for providing pivotalrotation of at least one workpiece about an axis of rotation, as part oftransporting the workpiece at least in relation to the process chamberarrangement, and for moving in a direction that is at least generallyalong said axis of rotation, as another part of transporting theworkpiece, to change an elevation of the swing arm such that theworkpiece being transported can be moved between different spaced-apartelevational planes in addition to said pivotal rotation.
 73. In aworkpiece processing system in which a plurality of workpieces aremovable to and from a process chamber arrangement that is configured forexecuting a treatment process on at least one of the workpieces, amethod comprising: arranging a workpiece support arrangement separatefrom said process chamber arrangement for supporting at least one ofsaid workpieces for movement in relation to the process chamberarrangement; pivotally rotating at least one workpiece about an axis ofrotation, as part of transporting the workpiece between the workpiecesupport arrangement and the process chamber arrangement using a swingarm arrangement that is separate from said process chamber arrangement;and moving said swing arm arrangement in a direction that is at leastgenerally along said axis of rotation, as another part of transportingthe workpiece, to change an elevation of the swing arm such that theworkpiece being transported can be moved between different spaced-apartelevational planes in addition to said pivotal rotation.
 74. The methodof claim 73 wherein moving said swing arm at least generally along saidaxis of rotation includes at least one of picking and placing one ofsaid workpieces at the workpiece support arrangement and the processchamber arrangement.
 75. The method of claim 73 wherein said systemincludes a loadlock and a transfer chamber such that the workpiece beingtransported is movable between the process chamber arrangement and theloadlock through the transfer chamber and said method includes locatingsaid workpiece support arrangement in said loadlock while locating theswing arm arrangement in the transfer chamber.
 76. The method of claim73 including configuring said swing arm arrangement to include first andsecond coaxial swing arms, each of which is configured to pivotallyrotate about said axis of rotation.
 77. The method of claim 73 includingconfiguring said first swing arm to include a shaft member that issupported for rotation about said axis of rotation and having an armmember extending transversely from the shaft member having a distal endthat is configured for supporting one of said workpieces and said shaftmember is supported for translational movement at least generally alongsaid axis of rotation.
 78. The method of claim 73 including configuringsaid first swing arm to include a first shaft member and a first armmember extending transversely therefrom, having a first distal end forsupporting a first one of said workpieces and configuring the swing armarrangement to further include a second swing arm including a secondshaft member and a second arm member extending transversely therefromhaving a second distal end for supporting a second one of the workpiecesand defining a through opening in said second shaft member that isarranged along said axis of rotation for coaxially receiving the firstshaft member of the first swing arm.
 79. In a workpiece processingsystem in which a plurality of workpieces are movable to and from aprocess chamber arrangement that is configured for executing a treatmentprocess on at least one of the workpieces, a method comprising:pivotally rotating at least one workpiece about an axis of rotation, aspart of transporting the workpiece in relation to said process chamberarrangement using a swing arm arrangement; and moving said swing armarrangement in a direction that is at least generally along said axis ofrotation, as another part of transporting the workpiece, to change anelevation of the swing arm such that the workpiece being transported canbe moved between different spaced-apart elevational planes in additionto said pivotal rotation.
 80. In a workpiece processing system in whicha plurality of workpieces are movable to and from a process chamberarrangement, said process chamber arrangement using at least one processstation that is configured for executing a treatment process on at leastone of the workpieces, an apparatus comprising: a workpiece supportarrangement in one spaced apart relationship from said process chamberarrangement for supporting at least one of said workpieces; and a swingarm arrangement in another spaced apart relationship from said processchamber arrangement including at least a first swing arm and a secondswing arm configured for coaxial rotation about a common axis ofrotation for use in transporting the workpieces between the workpiecesupport arrangement and the process chamber arrangement.
 81. Theapparatus of claim 80 wherein said first swing arm includes a firstshaft member and a first arm member extending transversely therefrom,having a first distal end for supporting a first one of said workpiecesand said second swing arm includes a second shaft member and a secondarm member extending transversely therefrom having a second distal endfor supporting a second one of the workpieces and said second shaftmember defines a through opening that is arranged along said axis ofrotation for coaxially receiving the first shaft member of the firstswing arm.
 82. The apparatus of claim 80 wherein said first swing armand said second swing arm are configured for counter-rotation such thatone of the swing arms rotates toward the process chamber arrangementwhile the other rotates toward the workpiece support arrangement.
 83. Ina workpiece processing system in which a plurality of workpieces aremovable to and from a process chamber arrangement, said process chamberarrangement using at least one process station that is configured forexecuting a treatment process on at least one of the workpieces, anapparatus comprising: a swing arm arrangement, forming part of saidsystem, including at least a first swing arm and a second swing armconfigured for coaxial rotation about a common axis of rotation for usein transporting the workpieces in relation to the process chamberarrangement.
 84. In a workpiece processing system in which a pluralityof workpieces are movable to and from a process chamber arrangement,said process chamber arrangement using at least one process station thatis configured for executing a treatment process on at least one of theworkpieces, a method comprising: positioning a workpiece supportarrangement in one spaced apart relationship from said process chamberarrangement for supporting at least one of said workpieces; andsupporting a swing arm arrangement in another spaced apart relationshipfrom said process chamber arrangement including at least a first swingarm and a second swing arm configured for coaxial rotation about acommon axis of rotation for use in transporting the workpieces betweenthe workpiece support arrangement and the process chamber arrangement.85. The method of claim 84 including configuring said first swing arm toinclude a first shaft member and a first arm member extendingtransversely therefrom, having a first distal end for supporting a firstone of said workpieces and configuring said second swing arm to includea second shaft member and a second arm member extending transverselytherefrom having a second distal end for supporting a second one of theworkpieces and defining a through opening in said second shaft memberthat is arranged along said axis of rotation for coaxially receiving thefirst shaft member of the first swing arm.
 86. The method of claim 84wherein said first swing arm and said second swing arm are configuredfor counter-rotation such that one of the swing arms rotates toward theprocess chamber arrangement while the other rotates toward the workpiecesupport arrangement.
 87. In a workpiece processing system in which aplurality of workpieces are movable to and from a process chamberarrangement, said process chamber arrangement using at least one processstation that is configured for executing a treatment process on at leastone of the workpieces, a method comprising: supporting a swing armarrangement, as part of said system, including at least a first swingarm and a second swing arm configured for coaxial rotation about acommon axis of rotation for use in transporting the workpieces inrelation to said process chamber arrangement.
 88. In a workpieceprocessing system for processing workpieces using a treatment process, asystem configuration comprising: a pair of side-by-side first and secondprocess stations, each process station configured for applying thetreatment process to one of said workpieces; a workpiece supportarrangement for supporting one or more of said workpieces, saidworkpiece support arrangement being positioned at a first distance atleast approximately equally from each of said process stations; and apair of first and second swing arm arrangements, which are arranged topivot about a first axis and a second axis, respectively, and each oneof the first axis and the second axis is positioned at leastapproximately at a second distance from the workpiece supportarrangement while said first axis is at least approximately spaced awayfrom said first process station by said second distance and said secondaxis is at least approximately spaced away from said second processstation by said second distance, such that the first process station,the second process station, the first axis, the second axis and thewafer column cooperate to define a pentagonal shape.
 89. The systemconfiguration of claim 88 wherein said workpiece support arrangement isconfigured for supporting a plurality of said workpieces at leastgenerally in a stacked relationship to form a workpiece column.
 90. Thesystem configuration of claim 88 wherein the first swing arm arrangementis configured for moving workpieces between the workpiece supportarrangement and the first process station and the second swing armarrangement is configured for moving workpieces between the workpiecesupport arrangement and the second process station.
 91. The systemconfiguration of claim 88 including a transfer chamber which supportssaid pair of swing arm arrangements.
 92. The system configuration ofclaim 91 including a loadlock for housing said wafer column such thatthe workpieces are moved between the process chamber arrangement and theloadlock through the transfer chamber.
 93. The system configuration ofclaim 88 wherein said second distance is less than said first distance.94. In a workpiece processing system for processing workpieces using atreatment process, a method comprising: providing a pair of side-by-sidefirst and second process stations, each process station configured forapplying the treatment process to one of said workpieces; positioning aworkpiece support arrangement for supporting one or more of saidworkpieces, at a first distance at least approximately equally from eachof said process stations; and locating a pair of first and second swingarm arrangements, which are arranged to pivot about a first axis and asecond axis, respectively, such that each one of the first axis and thesecond axis is positioned at least approximately at a second distancefrom the workpiece support arrangement while said first axis is at leastapproximately spaced away from said first process station by said seconddistance and said second axis is at least approximately spaced away fromsaid second process station by said second distance, such that the firstprocess station, the second process station, the first axis, the secondaxis and the wafer column cooperate to define a pentagonal shape. 95.The method of claim 94 including configuring said workpiece supportarrangement for supporting a plurality of said workpieces at leastgenerally in a stacked relationship to form a workpiece column.
 96. Themethod of claim 94 including configuring the first swing arm arrangementfor moving workpieces between the workpiece support arrangement and thefirst process station and the second swing arm arrangement is configuredfor moving workpieces between the workpiece support arrangement and thesecond process station.
 97. The method of claim 94 including providing atransfer chamber and supports said pair of swing arm arrangements in thetransfer chamber.
 98. The method of claim 97 including providing aloadlock for housing said wafer column such that the workpieces aremoved between the process chamber arrangement and the loadlock throughthe transfer chamber.
 99. The method of claim 94 including causing thesecond distance to be less than said first distance.
 100. In a workpieceprocessing system for processing workpieces using a treatment process, asystem configuration comprising: a pair of side-by-side first and secondprocess stations defining a line extending through a first center of thefirst process station and a second center of the second process station,each process station configured for applying the treatment process to atleast one of said workpieces; a workpiece support arrangement forsupporting at least one of said workpieces laterally offset from saidline; and a pair of first and second swing arm arrangements, each ofwhich pivots about a first axis and a second axis, respectively,arranged at a first swing arm location and a second swing arm location,and each of the first swing arm location and the second swing armlocation is offset from said line on a common side thereof toward, butnot beyond said workpiece support arrangement such that the firstprocess station, the second process station, the first axis, the secondaxis and the wafer column cooperate to define a pentagonal shape. 101.The system configuration of claim 100 wherein said workpiece supportarrangement is configured for supporting a plurality of said workpiecesat least generally in a stacked relationship to form a workpiece column.102. In a workpiece processing system for processing workpieces using atreatment process, a method comprising: providing a pair of side-by-sidefirst and second process stations defining a line extending through afirst center of the first process station and a second center of thesecond process station, each process station configured for applying thetreatment process to at least one of said workpieces; positioning aworkpiece support arrangement for supporting at least one of saidworkpieces laterally offset from said line; and locating a first axisand a second axis of a pair of first and second swing arm arrangements,respectively, at a first swing arm location and a second swing armlocation, such that each of the first swing arm location and the secondswing arm location is offset from said line on a common side thereoftoward, but not beyond said workpiece support arrangement so that thefirst process station, the second process station, the first axis, thesecond axis and the wafer column cooperate to define a pentagonal shape.103. The method of claim 102 including configuring said workpiecesupport arrangement for supporting a plurality of said workpieces atleast generally in a stacked relationship to form a workpiece column.104. In a system for using a first, driven shaft to rotationally drive asecond shaft, a configuration comprising: first and second toothedflexible closed-loop members; and a first pulley arrangement mounted onsaid first shaft and a second pulley arrangement mounted on said secondshaft for receiving the first and second toothed flexible members in aside-by-side relationship such that at least a particular one of thepulley arrangements includes a first pulley engaging the first toothedflexible member and a second pulley engaging the second toothed flexiblemember, each of the first and second pulleys having a tooth receivingconfiguration which cooperates with said first and second toothedflexible members to provide a given backlash clearance when engaged withthe first and second toothed belt members, respectively, and said firstpulley and said second pulley are mounted with a rotational offsettherebetween such that the tooth receiving configuration of the firstpulley is rotationally offset with respect to the tooth receivingconfiguration of the second pulley, based on said given backlashclearance, in a way which limits an operational backlash of theparticular pulley arrangement with respect to movement of the first andthe second toothed flexible members to a value that is less than thegiven backlash clearance.
 105. The configuration of claim 104 whereinsaid system is configured for processing workpieces and wherein saidfirst shaft is driven by a motor and said second shaft is used to driveat least one swing arm for use in moving workpieces within said system.106. The configuration of claim 104 wherein said first and secondtoothed flexible members are flexible belts.
 107. In a system for usinga first, driven shaft to rotationally drive a second shaft, a methodcomprising: providing first and second toothed flexible closed-loopmembers; and mounting a first pulley arrangement on said first shaft anda second pulley arrangement on said second shaft for receiving the firstand second toothed flexible members in a side-by-side relationship suchthat at least a particular one of the pulley arrangements includes afirst pulley engaging the first toothed flexible member and a secondpulley engaging the second toothed flexible member, each of the firstand second pulleys having a tooth receiving configuration whichcooperates with said first and second toothed flexible members toprovide a given backlash clearance when engaged with the first andsecond toothed belt members, respectively, and said first pulley andsaid second pulley are mounted with a rotational offset therebetweensuch that the tooth receiving configuration of the first pulley isrotationally offset with respect to the tooth receiving configuration ofthe second pulley, based on said given backlash clearance, in a waywhich limits an operational backlash of the particular pulleyarrangement with respect to movement of the first and the second toothedflexible members to a value that is less than the given backlashclearance.
 108. The method of claim 107 wherein said system isconfigured for processing workpieces and wherein said first shaft isdriven by a motor and said method includes using said second shaft todrive a swing arm for use in moving workpieces within said system. 109.The method of claim 108 wherein said first and second toothed flexiblemembers are flexible belts.
 110. For use in a workpiece processingsystem for processing workpieces, said system having at least twoadjacent chambers with a slot defined therebetween, through which slotsaid workpieces are transportable and a chamber sealing surface, that isat least generally planar, surrounding said slot and supporting asealing arrangement surrounding said slot, a valve apparatus forselectively opening and closing said slot, said valve apparatuscomprising: a sealing blade member including a blade surface that isconfigured for sealingly engaging said sealing arrangement; and anactuator arrangement for moving said sealing blade member between anopen position, away from the slot, to provide for passage of saidworkpieces therethrough, and a closed position in which the sealingblade member is brought into sealing contact at least with the sealingarrangement and for supporting the sealing blade member in a way whichprovides for movement of the blade surface, at least responsive toengagement with the sealing arrangement, that is characterized by twodegrees of freedom for aligning the blade surface with the sealingarrangement and, thereby, the sealing surface.
 111. The valve apparatusof claim 110 wherein said actuator arrangement includes a pivot shafthaving an elongation axis and said actuator arrangement includes asuspension arrangement that supports the sealing blade member and whichis pivotally supported by said pivot shaft for rotation about saidelongation axis.
 112. The valve apparatus of claim 111 wherein thesealing blade member includes a pair of opposing widthwise edges saidsuspension arrangement includes a suspension member having a pair ofopposing distal ends, each of which is used in supporting said sealingblade member proximate to one of said widthwise edges and saidsuspension member is pivotally received by said pivot shaft at a pivotpoint that is between said opposing distal ends.
 113. The valveapparatus of claim 112 wherein the suspension member includes a pair ofsuspension arms, each of which includes a suspension arm lengthextending at least approximately from said pivot point to one of saiddistal ends and said suspension arrangement further includes a firstresilient biasing arrangement that resiliently biases each one of thesuspension arms at a biasing point along the suspension arm lengthtoward the sealing blade member to provide for rotation of the sealingblade member about the elongation axis of the pivot shaft as the bladesurface engages the sealing arrangement and which brings the sealingblade member into a resiliently established open position, with respectto rotation about said elongation axis of the pivot shaft, when theblade surface is disengaged from the sealing arrangement.
 114. The valveapparatus of claim 113 wherein said suspension arrangement includes apair of pivot blocks, each of which is attached to said sealing blademember at least approximately adjacent to ore of said widthwise edgesand each of which pivot blocks pivotally receives one of the pair ofopposing distal ends of the suspension member for rotation of thesealing blade member about a lateral axis of rotation that is at leastapproximately orthogonal to the elongation axis of the pivot shaft. 115.The valve apparatus of claim 114 wherein said suspension arrangementincludes a second resilient biasing arrangement having a resilientmember that extends from said suspension member to the sealing blademember for co-rotating with the sealing blade member about saidelongation axis of the suspension member and for resiliently locatingsaid sealing blade member with respect to rotation about said lateralaxis of rotation when the blade surface is disengaged from the sealingarrangement and to provide for rotation of the sealing blade memberabout the lateral axis of rotation of the suspension member as the bladesurface engages the sealing arrangement.
 116. The valve apparatus ofclaim 110 wherein said actuator arrangement includes a pivot shafthaving an elongation axis that is supported for pivotal movement withina pivot shaft housing to pivotally move the sealing blade member in aconfronting relationship with the sealing surface and said pivot shafthousing includes a distal end at which the pivot shaft emerges therefromfor engaging the sealing blade member, said distal end having aball-shaped configuration and said actuator arrangement further includesa socket cap for sliding along a length of said pivot shaft whilemaintaining sealing therewith and defining a socket-shaped configurationfor nestingly engaging the ball-shaped configuration of said distal endsuch that the distal end of the pivot shaft housing seals against thesocket cap, in said confronting relationship, as the socket cap movespivotally with the pivot shaft.
 117. For use in a workpiece processingsystem for processing workpieces, said system having at least twoadjacent chambers with a slot defined therebetween, through which slotsaid workpieces are transportable and a chamber sealing surface, that isat least generally planar, surrounding said slot and supporting asealing arrangement surrounding said slot, a method for selectivelyopening and closing said slot, said method comprising: providing asealing blade member including a blade surface that is configured forsealingly engaging said sealing arrangement; and configuring an actuatorarrangement for moving said sealing blade member between an openposition, away from the slot, to provide for passage of said workpiecestherethrough, and a closed position in which the sealing blade member isbrought into sealing contact at least with the sealing arrangement andfor supporting the sealing blade member in a way which provides formovement of the blade surface, at least responsive to engagement withthe sealing arrangement, that is characterized by two degrees of freedomfor aligning the blade surface to the sealing arrangement and, thereby,the sealing surface.
 118. The method of claim 117 including providing apivot shaft, as part of the actuator arrangement, having an elongationaxis and suspending said blade member using a suspension arrangement tosupport the sealing blade member and pivotally supporting the suspensionarrangement on the pivot shaft for rotation about said elongation axis,thereby pivotally co-rotating the sealing blade member.
 119. The methodof claim 118 wherein the sealing blade member includes a pair ofopposing widthwise edges and said method includes forming saidsuspension arrangement to include a suspension member having a pair ofopposing distal ends and supporting said sealing blade member using thedistal ends of the suspension member proximate to each one of saidwidthwise edges and said suspension member is pivotally received by saidpivot shaft at a pivot point that is between said opposing distal ends.120. The method of claim 119 including arranging the suspension memberto include a pair of suspension arms, each of which includes asuspension arm length extending at least approximately from said pivotpoint to one of said distal ends and providing a first resilient biasingarrangement, as part of said suspension arrangement, that resilientlybiases each one of the suspension arms at a biasing point along eachsuspension arm length toward the sealing blade member to provide forrotation of the sealing blade member about the elongation axis of thepivot shaft as the blade surface engages the sealing arrangement andwhich brings the sealing blade member into a resiliently establishedopen position, with respect to rotation about said elongation axis ofthe pivot shaft, when the blade surface is disengaged from the sealingarrangement.
 121. The method of claim 120 including providing a pair ofpivot blocks as part of said suspension arrangement, attaching each ofsaid pivot blocks to said sealing blade member at least approximatelyadjacent to one of said widthwise edges and pivotally receiving one ofthe pair of opposing distal ends of the suspension member in each of thepivot blocks for rotation of the sealing blade member about a lateralaxis of rotation that is at least approximately orthogonal to theelongation axis of the pivot shaft.
 122. The method of claim 121including configuring a second resilient biasing arrangement, as part ofsaid suspension arrangement, by extending a resilient member from saidsuspension member to the sealing blade member to co-rotate with thesealing blade member about said elongation axis of the suspension memberand to resiliently locate said sealing blade member with respect torotation about said lateral axis of rotation when the blade surface isdisengaged from the sealing arrangement and to provide for rotation ofthe sealing blade member about the lateral axis of rotation of thesuspension member as the blade surface engages the sealing arrangement.123. The method of claim 117 including pivotally supporting a pivotshaft having an elongation axis, as part of said actuator arrangement,within a pivot shaft housing for pivotally moving the sealing blademember while in a confronting relationship with the sealing surface andconfiguring said pivot shaft housing to include a distal end at whichthe pivot shaft emerges therefrom for engaging the sealing blade member,said distal end having a ball-shaped configuration and configuring saidactuator arrangement to further include a socket cap for sliding along alength of said pivot shaft while maintaining sealing therewith and fordefining a socket-shaped configuration for nestingly engaging theball-shaped configuration of said distal end such that the distal end ofthe pivot shaft housing seals against the socket cap, in saidconfronting relationship, as the socket cap moves pivotally with thepivot shaft.
 124. For use in a workpiece processing system forprocessing workpieces, said system having at least two adjacent chambersthat are subject to contamination from internally and externallyproduced contaminants, a configuration comprising: a chamber bodyarrangement which serves to define said adjacent chambers and a slotbetween the adjacent chambers, through which slot said workpieces aretransportable and a chamber sealing surface, that is at least generallyplanar, surrounding said slot, said chamber body arrangement furtherdefining a chamber trough adjacent said slot and therebelow to form aportion of a particular one of the adjacent chambers such that thechamber trough establishes a lowermost region of said chamber bodyarrangement serving as a collection region for said contaminants, atleast in being under an influence of the Earth's gravity, and saidchamber body arrangement further defines a pumping port at least for usein evacuation of the particular chamber; a valve arrangement supportedin the particular chamber for selective movement between a closedposition, in which a sealing blade thereof seals against said slot toisolate the adjacent chambers from one another, and an open position, inwhich the sealing blade retracts into said trough; and a pumpingarrangement connected to said pumping port at least for use inevacuation of the particular chamber by pumping from said trough in away which serves to remove at least a portion of said contaminantscollected in the trough.
 125. The configuration of claim 124 whereinsaid pumping arrangement is configured to pump from said trough withsaid sealing blade in the closed position.
 126. The configuration ofclaim 124 wherein said particular chamber is a loadlock.
 127. Theconfiguration of claim 124 wherein the chamber body defining theparticular chamber further defines a purge port for introducing at leastone purge gas into the particular chamber for inducing a gas flow fromthe purge port to the pump port in said trough in a way which causescontaminants in the particular chamber to generally flow into saidtrough and, thereafter, into said pump port.
 128. For use in a workpieceprocessing system for processing workpieces, said system having at leasttwo adjacent chambers that are subject to contamination from internallyand externally produced contaminants, a method comprising: providing achamber body arrangement which serves to define said adjacent chambersand a slot between the adjacent chambers, through which slot saidworkpieces are transportable and a chamber sealing surface, that is atleast generally planar, surrounding said slot, said chamber bodyarrangement further defining a chamber trough adjacent said slot andtherebelow to form a portion of a particular one of the adjacentchambers such that the chamber trough establishes a lowermost region ofsaid chamber body arrangement serving as a collection region for saidcontaminants, at least in being under an influence of the Earth'sgravity, and said chamber body arrangement further defines a pumpingport at least for use in evacuation of the particular chamber;supporting a valve arrangement in the particular chamber for selectivemovement between a closed position, in which a sealing blade thereofseals against said slot to isolate the adjacent chambers from oneanother, and an open position, in which the sealing blade retracts intosaid trough; and pumping from said pumping port using a pumpingarrangement connected thereto at least for use in evacuation of theparticular chamber in a way which serves to remove at least a portion ofsaid contaminants collected in the trough.
 129. The method of claim 128including configuring said pumping arrangement to pump from said troughwith said sealing blade in the closed position.
 130. The method of claim128 including configuring said particular chamber as a loadlock. 131.The method of claim 128 including using the chamber body defining theparticular chamber to further define a purge port for introducing atleast one purge gas into the particular chamber for inducing a gas flowfrom the purge port to the pump port in said trough in a way whichcauses contaminants in the particular chamber to generally flow intosaid trough and, thereafter, into said pump port.